Počet záznamů: 1

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

  1. 1.
    0342469 - FZU-D 2011 RIV US eng J - Článek v odborném periodiku
    Khorsand, A.R. - Sobierajski, R. - Louis, E. - Bruijn, S. - van Hattum, E.D. - van de Kruijs, R.W.E. - Jurek, M. - Klinger, D. - Pelka, J. B. - Juha, Libor - Burian, Tomáš - Chalupský, Jaromír - Cihelka, Jaroslav - Hájková, Věra - Vyšín, Luděk - Jastrow, U. - Stojanovic, N. - Toleikis, S. - Wabnitz, H. - Tiedtke, K. - Sokolowski-Tinten, K. - Shymanovich, U. - Krzywinski, J. - Hau-Riege, S. - London, R. - Gleeson, A. - Gullikson, E.M. - Bijkerk, F.
    Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure.
    Optics Express. Roč. 18, č. 2 (2010), 700-712 ISSN 1094-4087
    Grant CEP: GA AV ČR KAN300100702; GA MŠk LC510; GA MŠk(CZ) LC528; GA MŠk LA08024; GA AV ČR IAA400100701
    Výzkumný záměr: CEZ:AV0Z10100523
    Klíčová slova: laser damage * thermal effects * multilayers * optical design and fabrication * free-electron lasers
    Kód oboru RIV: BH - Optika, masery a lasery
    Impakt faktor: 3.749, rok: 2010

    We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and "post-mortem" by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources.
    Trvalý link: http://hdl.handle.net/11104/0185200