Search results
- 1.0574607 - FZÚ 2024 RIV NL eng J - Journal Article
Tereshina-Chitrova, Evgenia - Havela, L. - Paukov, M. - Koloskova, O. - Horák, L. - Dopita, M. - Celis, M.M. - Cieslar, M. - Šobáň, Zbyněk - Gouder, T. - Huber, F.
Synthesis and physical properties of uranium thin-film hydrides UH2 and UH3.
Thin Solid Films. Roč. 775, June (2023), č. článku 139860. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA ČR(CZ) GA21-09766S; GA MŠMT LM2018110; GA MŠMT(CZ) LM2018096
Institutional support: RVO:68378271
Keywords : uranium hydrides films * UH2 * UH3 * ferromagnetic U-hydrides * reactive sputtering * X-ray photoelectron spectroscopy
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 2.1, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.tsf.2023.139860
Permanent Link: https://hdl.handle.net/11104/0346002 - 2.0562485 - FZÚ 2023 RIV US eng J - Journal Article
Hrubantová, Aneta - Hippler, Rainer - Wulff, H. - Čada, Martin - Olejníček, Jiří - Nepomniashchaia, Natalia - Helm, C.A. - Hubička, Zdeněk
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 40, č. 6 (2022), č. článku 063402. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : reactive sputtering * plasma * thin films * semiconductor * XRD
OECD category: Coating and films
Impact factor: 2.9, year: 2022
Method of publishing: Limited access
https://doi.org/10.1116/6.0002012
Permanent Link: https://hdl.handle.net/11104/0335052 - 3.0551244 - FZÚ 2022 RIV cze P1 - User Module
Hubička, Zdeněk - Čada, Martin - Kšírová, Petra - Houha, R. - Matulová, L.
Optický polovodivý prvek.
[Optical semiconductor element.]
2021. Owner: Fyzikální ústav AV ČR, v. v. i - IQS group, s.r.o. Date of the utility model acceptance: 05.08.2021. Utility model number: 35307
R&D Projects: GA MPO FV20580
Institutional support: RVO:68378271
Keywords : optical element * thin film * semiconductor * gradient film * reactive sputtering * impedance spectroscopy
OECD category: Optics (including laser optics and quantum optics)
https://isdv.upv.cz/doc/FullFiles/UtilityModels/FullDocuments/FDUM0035/uv035307.pdf
Permanent Link: http://hdl.handle.net/11104/0326690 - 4.0512095 - FZÚ 2020 RIV NL eng J - Journal Article
Hubička, Zdeněk - Zlámal, M. - Čada, Martin - Kment, Štěpán - Krysa, J.
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering.
Catalysis Today. Roč. 328, May (2019), s. 29-34. ISSN 0920-5861. E-ISSN 1873-4308
R&D Projects: GA ČR GA17-20008S; GA MŠMT(CZ) EF16_019/0000760
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : high power impulse magnetron sputtering * reactive sputtering * magnetron discharge * photocathode * photocurrent * copper oxide
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 5.825, year: 2019
Method of publishing: Limited access
https://doi.org/10.1016/j.cattod.2018.11.034
Permanent Link: http://hdl.handle.net/11104/0302301 - 5.0486980 - FZÚ 2018 RIV US eng J - Journal Article
Čada, Martin - Lundin, D. - Hubička, Zdeněk
Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures.
Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-7, č. článku 171913. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA ČR(CZ) GA15-00863S
EU Projects: European Commission(XE) 608800 - HIPPOCAMP
Institutional support: RVO:68378271
Keywords : reactive sputtering * HiPIMS * Langmuir probe * R-IRM model * plasma density * electron temperature
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.176, year: 2017
Permanent Link: http://hdl.handle.net/11104/0281686 - 6.0486358 - FZÚ 2018 RIV US eng C - Conference Paper (international conference)
Kleiner, A. - Suchaneck, G. - Dejneka, Alexandr - Jastrabík, Lubomír - Lavrentev, Vasyl - Kiselev, D.A. - Gerlach, G.
Multitarget sputtering of PZT-containing mixed oxide thin films onto copper-coated kapton substrates.
Proceedings of International Conference On Oxide Materials For Electronic Engineering (OMEE). New York: IEEE, 2014 - (Shpotyuk, M.), s. 19-20, č. článku 6912320. ISBN 978-1-4799-5961-7.
[2014 IEEE International Conference On Oxide Materials For Electronic Engineering (OMEE). Lviv (UA), 26.05.2014-30.05.2014]
Institutional support: RVO:68378271
Keywords : complex oxide film deposition * multitarget reactive sputtering * flexible polymer substrate * composition profile * piezoresponse force microscopy * PZT
OECD category: Fluids and plasma physics (including surface physics)
http://ieeexplore.ieee.org/document/6912320/
Permanent Link: http://hdl.handle.net/11104/0281194 - 7.0464208 - FZÚ 2017 RIV DE eng A - Abstract
Čada, Martin - Lundin, D. - Hubička, Zdeněk
Direct measurements of the ion flux at the substrate in reactive HiPIMS.
International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. Braunschweig: European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016. s. 415-415.
[International Conference on Plasma Surface Engineering ( PSE 2016 ). 12.09.2016-16.09.2016, Garmisch-Partenkirchen]
R&D Projects: GA ČR(CZ) GA15-00863S; GA TA ČR TA03010743
EU Projects: European Commission(XE) 608800 - HIPPOCAMP
Institutional support: RVO:68378271
Keywords : HiPIMS * impedance * ion flux * reactive sputtering
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0263191 - 8.0436748 - FZÚ 2015 RIV CZ cze L - Prototype, f. module
Hubička, Zdeněk - Čada, Martin - Adámek, Petr
Multifunkční držák substrátu pro plazmové depozice tenkých optických vrstev.
[Multifunctional substrate holder for plasma depositions of optical thin films.]
Internal code: MFSH2014 ; 2014
Technical parameters: Rotační rychlost: 0-200 RPM; vakuová těsnost: 1x10-10 mbar l s-1; maximální dosažená teplota: 400 °C; maximální příkon vytápění: 180 W; maximální amplituda RF předpětí při frekvenci 13.56 MHz: 1000 V
Economic parameters: Laboratorní zařízení nezbytné pro další aplikovaný výzkum
R&D Projects: GA TA ČR TA01010517
Institutional support: RVO:68378271
Keywords : sputtering * thin films * plasma * deposition * magnetron * reactive sputtering
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0240432 - 9.0427184 - FZÚ 2015 RIV CH eng J - Journal Article
Kubart, T. - Čada, Martin - Lundin, D. - Hubička, Zdeněk
Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets.
Surface and Coatings Technology. Roč. 238, JAN (2014), s. 152-157. ISSN 0257-8972
R&D Projects: GA MŠMT LD12002; GA ČR GAP108/12/2104; GA MŠMT LH12043
Grant - others:AV ČR(CZ) M100101215
Institutional support: RVO:68378271
Keywords : HiPIMS * reactive sputtering * ionized flux fraction
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 1.998, year: 2014
Permanent Link: http://hdl.handle.net/11104/0232785 - 10.0364652 - FZÚ 2012 RIV CH eng J - Journal Article
Suchaneck, G. - Labitzke, R. - Adolphi, B. - Jastrabík, Lubomír - Adámek, Petr - Drahokoupil, Jan - Hubička, Zdeněk - Kiselev, D.A. - Kholkin, A. L. - Gerlach, G. - Dejneka, Alexandr
Deposition of PZT thin film onto copper-coated polymer films by mean of pulsed-DC and RF-reactive sputtering.
Surface and Coatings Technology. Roč. 205, č. 2 (2011), S241-S244. ISSN 0257-8972
R&D Projects: GA ČR GC202/09/J017; GA AV ČR KAN301370701; GA MŠMT(CZ) 1M06002
Institutional research plan: CEZ:AV0Z10100522
Keywords : pulsed DC reactive sputtering * RF reactive sputtering * complex oxide film deposition * polymer substrate
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 1.867, year: 2011
Permanent Link: http://hdl.handle.net/11104/0200083