Search results
- 1.0429792 - ÚPT 2019 RIV CZ eng C - Conference Paper (international conference)
Urbánek, Michal - Kolařík, Vladimír - Krátký, Stanislav - Matějka, Milan - Horáček, Miroslav - Chlumská, Jana
Monte-Carlo simulation of proximity effect in e-beam lithography.
NANOCON 2013. 5th International Conference Proceedings. Ostrava: TANGER Ltd, 2013, s. 723-726. ISBN 978-80-87294-44-4.
[NANOCON 2013. International Conference /5./. Brno (CZ), 16.10.2013-18.10.2013]
R&D Projects: GA MŠMT ED0017/01/01; GA MŠMT EE.2.3.20.0103; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : Monte–Carlo * proximity effect simulation * e–beam lithography
OECD category: Optics (including laser optics and quantum optics)
Permanent Link: http://hdl.handle.net/11104/0234836 - 2.0429463 - ÚPT 2015 GB eng A - Abstract
Urbánek, Michal - Matějka, Milan - Kolařík, Vladimír - Horáček, Miroslav - Krátký, Stanislav - Bok, Jan - Chlumská, Jana - Mikšík, P. - Vašina, J.
Variable shape E-beam writing: proximity effect simulation and correction of binary and relief structures.
39th International Conference on Micro and Nano Engineering MNE2013. Book of Abstracts. Cambridge: University of Cambridge, 2013. s. 582.
[MNE2013. International Conference on Micro and Nano Engineering /39./. 16.09.2013-19.09.2013, London]
Institutional support: RVO:68081731
Keywords : rectangular shaped beam * proximity effect simulation * binary structures and relief structures
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0234576 - 3.0390982 - ÚPT 2013 RIV CZ eng C - Conference Paper (international conference)
Matějka, Milan - Urbánek, M. - Kolařík, V. - Horáček, M. - Krátký, Stanislav - Mikšík, P. - Vašina, J.
Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures.
NANOCON 2012, 4th International Conference Proceedings. Ostrava: TANGER Ltd, 2012, s. 729-732. ISBN 978-80-87294-32-1.
[NANOCON 2012. International Conference /4./. Brno (CZ), 23.10.2012-25.10.2012]
R&D Projects: GA MPO FR-TI1/576; GA MŠMT ED0017/01/01; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : 3D resist structures * variable shape electron beam lithography * proximity effect simulation and correction * polymer resist * development process simulation
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0219947