Search results
- 1.0525062 - ÚPT 2021 RIV NL eng J - Journal Article
Frank, Luděk - Hovorka, Miloš - El Gomati, M. M. - Müllerová, Ilona - Mika, Filip - Mikmeková, Eliška
Acquisition of the dopant contrast in semiconductors with slow electrons.
Journal of Electron Spectroscopy and Related Phenomena. Roč. 241, MAY (2020), č. článku 146836. ISSN 0368-2048. E-ISSN 1873-2526
R&D Projects: GA TA ČR(CZ) TE01020118; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
EU Projects: European Commission(XE) 606988 - SIMDALEE2
Institutional support: RVO:68081731
Keywords : semiconductors * dopant contrast * low energy SEM * PEEM * mirror electron microscopy * surface treatments
OECD category: Electrical and electronic engineering
Impact factor: 1.957, year: 2020
Method of publishing: Open access
https://www.sciencedirect.com/science/article/pii/S036820481830135X
Permanent Link: http://hdl.handle.net/11104/0309284 - 2.0375383 - ÚPT 2012 RIV GB eng J - Journal Article
Müllerová, Ilona - Hovorka, Miloš - Mika, Filip - Mikmeková, Eliška - Mikmeková, Šárka - Pokorná, Zuzana - Frank, Luděk
Very low energy scanning electron microscopy in nanotechnology.
International Journal of Nanotechnology. Roč. 9, 8/9 (2012), s. 695-716. ISSN 1475-7435. E-ISSN 1741-8151
R&D Projects: GA MŠMT OE08012; GA MŠMT ED0017/01/01; GA AV ČR IAA100650902
Institutional research plan: CEZ:AV0Z20650511
Keywords : scanning electron microscopy * very low energy electrons * cathode lens * grain contrast * strain contrast * imaging of participates * dopant contrast * very low energy STEM * graphene
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.087, year: 2012
Permanent Link: http://hdl.handle.net/11104/0208054 - 3.0368827 - ÚPT 2012 RIV CZ eng C - Conference Paper (international conference)
Müllerová, Ilona - Hovorka, Miloš - Mikmeková, Šárka - Pokorná, Zuzana - Mikmeková, Eliška - Frank, Luděk
Scanning Very Low Energy Electron Microscopy.
NANOCON 2011. 3rd International Conference. Ostrava: Tanger spol. s r. o, 2011, s. 238-243. ISBN 978-80-87294-27-7.
[NANOCON 2011. International Conference /3./. Brno (CZ), 21.09.2011-23.09.2011]
R&D Projects: GA ČR GAP108/11/2270; GA AV ČR IAA100650902
Institutional research plan: CEZ:AV0Z20650511
Keywords : scanning electron microscopy * low energy electrons * grain contrast * transmitted electrons * dopant contrast * thin films
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0203060 - 4.0367773 - ÚPT 2012 RIV US eng J - Journal Article
Müllerová, Ilona - Mikmeková, Šárka - Hovorka, Miloš - Frank, Luděk
Unconventional Imaging with Backscattered Electrons.
Microscopy and Microanalysis. Roč. 17, Suppl. 2 (2011), s. 900-901. ISSN 1431-9276. E-ISSN 1435-8115
Institutional research plan: CEZ:AV0Z20650511
Keywords : SEM * low energies * grain contrast * dopant contrast * internal stress
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 3.007, year: 2011
Permanent Link: http://hdl.handle.net/11104/0202327 - 5.0352508 - ÚPT 2011 RIV JP eng C - Conference Paper (international conference)
Hovorka, Miloš - Frank, Luděk
Mapping of Dopants in Silicon by Injection of Electrons.
Proceedings of 5th Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology. Toyama: University of Toyama, 2010, s. 15-18. ISBN 978-4-9903248-2-7.
[JCNCS2010 /5./ Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology. Toyama (JP), 12.09.2010-15.09.2010]
Institutional research plan: CEZ:AV0Z20650511
Keywords : semiconductors * dopant contrast * very low energy SEM
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0192000 - 6.0340745 - ÚPT 2010 RIV JP eng J - Journal Article
Hovorka, Miloš - Mika, Filip - Mikulík, P. - Frank, Luděk
Profiling N-Type Dopants in Silicon.
Materials Transactions. Roč. 51, č. 2 (2010), s. 237-242. ISSN 1345-9678. E-ISSN 1347-5320
R&D Projects: GA ČR GP102/09/P543; GA AV ČR IAA100650803
Institutional research plan: CEZ:AV0Z20650511
Keywords : silicon * dopant contrast * photoemission electron microscopy * scanning electron microscopy
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 0.779, year: 2010
http://www.jim.or.jp/journal/e/51/02/237.html
Permanent Link: http://hdl.handle.net/11104/0183926 - 7.0335263 - ÚPT 2010 RIV AT eng C - Conference Paper (international conference)
Mika, Filip - Hovorka, Miloš - Frank, Luděk
Secondary electron contrast in doped semiconductor with presence of a surface ad-layer.
MC 2009 - Microscopy Conference: First Joint Meeting of Dreiländertagung and Multinational Conference on Microscopy. Graz: Verlag der Technischen Universität, 2009, Vol. 1: 199-200. ISBN 978-3-85125-062-6.
[MC 2009 - Joint Meeting of Dreiländertagung and Multinational Congress on Microscopy /9./. Graz (AT), 30.08.2009-04.09.2009]
R&D Projects: GA ČR GP102/09/P543; GA AV ČR IAA100650803
Institutional research plan: CEZ:AV0Z20650511
Keywords : dopant contrast * secondary electrons * semiconductor
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
http://www.univie.ac.at/asem/Graz_MC_09/papers/51426.pdf
Permanent Link: http://hdl.handle.net/11104/0179773 - 8.0308202 - ÚPT 2008 RIV GB eng J - Journal Article
Mika, Filip - Frank, Luděk
Two-dimensional dopant profiling with low energy SEM.
[Tvorba dvourozměrných profilů dopantu s níkoenergiovým SEM.]
Journal of Microscopy. Roč. 230, č. 1 (2008), s. 76-83. ISSN 0022-2720. E-ISSN 1365-2818
R&D Projects: GA ČR GA102/05/2327
Institutional research plan: CEZ:AV0Z20650511
Keywords : dopant contrast * low energy SEM * semiconductors
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.409, year: 2008
Permanent Link: http://hdl.handle.net/11104/0160756 - 9.0092590 - ÚPT 2008 RIV CZ eng C - Conference Paper (international conference)
Mika, Filip - Frank, Luděk
Dynamic Behaviour of the Dopant Contrast in LVSEM.
[Dynamické chování kontrastu dopantů v LVSEM.]
Proceedings of the 8th Multinational Congress on Microscopy. Prague: Czechoslovak Microscopy Society, 2007 - (Nebesářová, J.; Hozák, P.), s. 95-96. ISBN 978-80-239-9397-4.
[Multinational Congress on Microscopy /8./. Prague (CZ), 17.06.2007-21.06.2007]
R&D Projects: GA ČR GA102/05/2327
Institutional research plan: CEZ:AV0Z20650511
Keywords : dopant contrast * LVSEM * secondary electrons
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0152868 - 10.0082251 - ÚPT 2007 RIV JP eng J - Journal Article
Frank, Luděk - Mika, Filip - Hovorka, Miloš - Valdaitsev, D. - Schönhense, G. - Müllerová, Ilona
Dopant Contrast in Semiconductors as Interpretation Challenge at Imaging by Electrons.
[Kontrast dopantu jako interpretační problém při zobrazování elektrony.]
Materials Transactions. Roč. 48, č. 5 (2007), s. 936-939. ISSN 1345-9678. E-ISSN 1347-5320
R&D Projects: GA ČR GA202/04/0281
Institutional research plan: CEZ:AV0Z20650511
Keywords : electron microscopic contrasts * semiconductors * dopant contrast * scanning electron microscopy * scanning low energy electron microscopy * photoelectron emission microscopy
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.018, year: 2007
Permanent Link: http://hdl.handle.net/11104/0145867