Search results

  1. 1.
    0541020 - FZÚ 2021 RIV US eng J - Journal Article
    Ross, A. - Lebrun, R. - Gomonay, O. - Grave, D.A. - Kay, A. - Baldrati, L. - Becker, S. - Qaiumzadeh, A. - Ulloa, C. - Jakob, G. - Kronast, F. - Sinova, Jairo - Duine, R. - Brataas, A. - Rothschild, A. - Klaeui, M.
    Propagation length of antiferrornagnetic magnons governed by domain configurations.
    Nano Letters. Roč. 20, č. 1 (2020), s. 306-313. ISSN 1530-6984. E-ISSN 1530-6992
    EU Projects: European Commission(XE) 766566 - ASPIN
    Institutional support: RVO:68378271
    Keywords : antiferromagnets * magnons * magnetic domains * XMLD-PEEM magnetic imaging * spin transport * magnon scattering
    OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
    Impact factor: 11.189, year: 2020
    Method of publishing: Limited access
    https://doi.org/10.1021/acs.nanolett.9b03837
    Permanent Link: http://hdl.handle.net/11104/0318592
     
     
  2. 2.
    0525062 - ÚPT 2021 RIV NL eng J - Journal Article
    Frank, Luděk - Hovorka, Miloš - El Gomati, M. M. - Müllerová, Ilona - Mika, Filip - Mikmeková, Eliška
    Acquisition of the dopant contrast in semiconductors with slow electrons.
    Journal of Electron Spectroscopy and Related Phenomena. Roč. 241, MAY (2020), č. článku 146836. ISSN 0368-2048. E-ISSN 1873-2526
    R&D Projects: GA TA ČR(CZ) TE01020118; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01
    EU Projects: European Commission(XE) 606988 - SIMDALEE2
    Institutional support: RVO:68081731
    Keywords : semiconductors * dopant contrast * low energy SEM * PEEM * mirror electron microscopy * surface treatments
    OECD category: Electrical and electronic engineering
    Impact factor: 1.957, year: 2020
    Method of publishing: Open access
    https://www.sciencedirect.com/science/article/pii/S036820481830135X
    Permanent Link: http://hdl.handle.net/11104/0309284
     
     
  3. 3.
    0385323 - ÚPT 2013 RIV NL eng J - Journal Article
    Oral, Martin - Radlička, Tomáš - Lencová, B.
    Effect of sample tilt on PEEM resolution.
    Ultramicroscopy. Roč. 119, S1 (2012), s. 45-50. ISSN 0304-3991. E-ISSN 1879-2723
    R&D Projects: GA AV ČR IAA100650805
    Institutional support: RVO:68081731
    Keywords : PEEM * LEEM * Aberrations * Misalignment * Sample tilt * Point spread function * Resolution
    Subject RIV: BH - Optics, Masers, Lasers
    Impact factor: 2.470, year: 2012
    Permanent Link: http://hdl.handle.net/11104/0214610
     
     
  4. 4.
    0350659 - ÚPT 2011 RIV CZ eng C - Conference Paper (international conference)
    Konvalina, Ivo - Hovorka, Miloš - Müllerová, Ilona
    Electron optical properties of the cathode lens combined with a focusing magnetic/immersion-magnetic lens.
    Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Brno: Institute of Scientific Instruments AS CR, v.v.i, 2010 - (Mika, F.), s. 21-22. ISBN 978-80-254-6842-5.
    [International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /12./. Skalský dvůr (CZ), 31.05.2010-04.06.2010]
    R&D Projects: GA AV ČR IAA100650902
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : cathode lens * PEEM * LEEM * SEM * EOD software
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Permanent Link: http://hdl.handle.net/11104/0190599
     
     
  5. 5.
    0335293 - ÚPT 2011 RIV CZ eng C - Conference Paper (international conference)
    Hovorka, Miloš - Mika, Filip - Frank, Luděk - Mikulík, P.
    Profiling of N-Type Dopants in Silicon Based Structures.
    Proceedings of the 4th Czech-Japan-China Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology (CJCS’09). Brno: ISI AS CR, 2009 - (Pokorná, Z.; Mika, F.), s. 14. ISBN 978-80-254-4535-8.
    [CJCS’09 - Czech-Japan-China Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology /4./. Brno (CZ), 10.08.2009-14.08.2009]
    R&D Projects: GA ČR GP102/09/P543; GA AV ČR IAA100650803
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : n-type substrate * SEM * PEEM * doping levels
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Permanent Link: http://hdl.handle.net/11104/0179799
     
     
  6. 6.
    0335261 - ÚPT 2010 RIV AT eng C - Conference Paper (international conference)
    Hovorka, Miloš - Mika, Filip - Frank, Luděk
    Profiling of N-type dopants in silicon structures.
    MC 2009 - Microscopy Conference: First Joint Meeting of Dreiländertagung and Multinational Conference on Microscopy. Graz: Verlag der Technischen Universität, 2009, Vol. 1: 181-182. ISBN 978-3-85125-062-6.
    [MC 2009 - Joint Meeting of Dreiländertagung and Multinational Congress on Microscopy /9./. Graz (AT), 30.08.2009-04.09.2009]
    R&D Projects: GA ČR GP102/09/P543; GA AV ČR IAA100650803
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : silicon * dopants * PEEM * SEM
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    http://www.univie.ac.at/asem/Graz_MC_09/papers/19923.pdf
    Permanent Link: http://hdl.handle.net/11104/0179772
     
     
  7. 7.
    0308431 - ÚPT 2008 CZ cze K - Conference Paper (Czech conference)
    Hovorka, Miloš - Mika, Filip - Frank, Luděk
    Možnosti zobrazení dopovaných křemíkových struktur v PEEM a LVSEM.
    [Imaging of doped silicon structures using PEEM and LVSEM.]
    Mikroskopie 2008. Praha: Československá mikroskopická společnost, 2008 - (Frank, L.), s. 21. ISBN N.
    [Mikroskopie 2008. Nové Město na Moravě (CZ), 07.02.2008-08.02.2008]
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : dopants * PEEM * SEM * silicon
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Permanent Link: http://hdl.handle.net/11104/0160916
     
     
  8. 8.
    0308215 - ÚPT 2008 RIV CZ eng J - Journal Article
    Frank, Luděk
    Beamline for Photoemission Spectromicroscopy and Spin Polarized Microscopy with Slow Electrons at CESLAB.
    [Beamline pro fotoemisní spektromikroskopii a spinově polarizovanou mikroskopii s pomalými elektrony v CESLAB.]
    Materials structure. Roč. 15, č. 1 (2008), s. 111-112. ISSN 1210-8529
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : CESLAB * beamline * LEEM/PEEM
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Permanent Link: http://hdl.handle.net/11104/0160767
     
     
  9. 9.
    0308203 - ÚPT 2008 RIV GB eng J - Journal Article
    Hovorka, Miloš - Frank, Luděk - Valdaitsev, D. - Nepijko, S. - Elmers, H. - Schönhense, G.
    High-pass energy-filtered photoemission electron microscopy imaging of dopants in silicon.
    [Studium vlastností dotovaného křemíku pomocí fotoemisní elektronové mikroskopie s využitím energiového filtru.]
    Journal of Microscopy. Roč. 230, č. 1 (2008), s. 42-47. ISSN 0022-2720. E-ISSN 1365-2818
    R&D Projects: GA ČR GA102/05/2327
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : dopants * energy-filtered imaging * PEEM * silicon
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Impact factor: 1.409, year: 2008
    Permanent Link: http://hdl.handle.net/11104/0160757
     
     
  10. 10.
    0050911 - ÚPT 2007 RIV JP eng C - Conference Paper (international conference)
    Frank, Luděk - Müllerová, Ilona - Valdaitsev, D. - Nepijko, S. - Gloskovskii, A. - Elmers, H. - Schönhense, G.
    Origin of the dopant contrast in PEEM micrographs.
    [Původ kontrastu dopantu v mikrosnímcích PEEM.]
    The 5th International Conference on LEEM/PEEM. Himeji: JSRRI, 2006, s. 220.
    [LEEM/PEEM /5./. Himeji (JP), 15.10.2006-19.10.2006]
    Institutional research plan: CEZ:AV0Z20650511
    Keywords : PEEM * dopant contrast
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Permanent Link: http://hdl.handle.net/11104/0140941