Search results
- 1.0541020 - FZÚ 2021 RIV US eng J - Journal Article
Ross, A. - Lebrun, R. - Gomonay, O. - Grave, D.A. - Kay, A. - Baldrati, L. - Becker, S. - Qaiumzadeh, A. - Ulloa, C. - Jakob, G. - Kronast, F. - Sinova, Jairo - Duine, R. - Brataas, A. - Rothschild, A. - Klaeui, M.
Propagation length of antiferrornagnetic magnons governed by domain configurations.
Nano Letters. Roč. 20, č. 1 (2020), s. 306-313. ISSN 1530-6984. E-ISSN 1530-6992
EU Projects: European Commission(XE) 766566 - ASPIN
Institutional support: RVO:68378271
Keywords : antiferromagnets * magnons * magnetic domains * XMLD-PEEM magnetic imaging * spin transport * magnon scattering
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 11.189, year: 2020
Method of publishing: Limited access
https://doi.org/10.1021/acs.nanolett.9b03837
Permanent Link: http://hdl.handle.net/11104/0318592 - 2.0525062 - ÚPT 2021 RIV NL eng J - Journal Article
Frank, Luděk - Hovorka, Miloš - El Gomati, M. M. - Müllerová, Ilona - Mika, Filip - Mikmeková, Eliška
Acquisition of the dopant contrast in semiconductors with slow electrons.
Journal of Electron Spectroscopy and Related Phenomena. Roč. 241, MAY (2020), č. článku 146836. ISSN 0368-2048. E-ISSN 1873-2526
R&D Projects: GA TA ČR(CZ) TE01020118; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01
EU Projects: European Commission(XE) 606988 - SIMDALEE2
Institutional support: RVO:68081731
Keywords : semiconductors * dopant contrast * low energy SEM * PEEM * mirror electron microscopy * surface treatments
OECD category: Electrical and electronic engineering
Impact factor: 1.957, year: 2020
Method of publishing: Open access
https://www.sciencedirect.com/science/article/pii/S036820481830135X
Permanent Link: http://hdl.handle.net/11104/0309284 - 3.0385323 - ÚPT 2013 RIV NL eng J - Journal Article
Oral, Martin - Radlička, Tomáš - Lencová, B.
Effect of sample tilt on PEEM resolution.
Ultramicroscopy. Roč. 119, S1 (2012), s. 45-50. ISSN 0304-3991. E-ISSN 1879-2723
R&D Projects: GA AV ČR IAA100650805
Institutional support: RVO:68081731
Keywords : PEEM * LEEM * Aberrations * Misalignment * Sample tilt * Point spread function * Resolution
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 2.470, year: 2012
Permanent Link: http://hdl.handle.net/11104/0214610 - 4.0350659 - ÚPT 2011 RIV CZ eng C - Conference Paper (international conference)
Konvalina, Ivo - Hovorka, Miloš - Müllerová, Ilona
Electron optical properties of the cathode lens combined with a focusing magnetic/immersion-magnetic lens.
Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Brno: Institute of Scientific Instruments AS CR, v.v.i, 2010 - (Mika, F.), s. 21-22. ISBN 978-80-254-6842-5.
[International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /12./. Skalský dvůr (CZ), 31.05.2010-04.06.2010]
R&D Projects: GA AV ČR IAA100650902
Institutional research plan: CEZ:AV0Z20650511
Keywords : cathode lens * PEEM * LEEM * SEM * EOD software
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
http://arl-repository.lib.cas.cz/uloziste_av/UPT-D/cav_un_epca-0350659_01.pdf
Permanent Link: http://hdl.handle.net/11104/0190599 - 5.0335293 - ÚPT 2011 RIV CZ eng C - Conference Paper (international conference)
Hovorka, Miloš - Mika, Filip - Frank, Luděk - Mikulík, P.
Profiling of N-Type Dopants in Silicon Based Structures.
Proceedings of the 4th Czech-Japan-China Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology (CJCS’09). Brno: ISI AS CR, 2009 - (Pokorná, Z.; Mika, F.), s. 14. ISBN 978-80-254-4535-8.
[CJCS’09 - Czech-Japan-China Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology /4./. Brno (CZ), 10.08.2009-14.08.2009]
R&D Projects: GA ČR GP102/09/P543; GA AV ČR IAA100650803
Institutional research plan: CEZ:AV0Z20650511
Keywords : n-type substrate * SEM * PEEM * doping levels
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0179799 - 6.0335261 - ÚPT 2010 RIV AT eng C - Conference Paper (international conference)
Hovorka, Miloš - Mika, Filip - Frank, Luděk
Profiling of N-type dopants in silicon structures.
MC 2009 - Microscopy Conference: First Joint Meeting of Dreiländertagung and Multinational Conference on Microscopy. Graz: Verlag der Technischen Universität, 2009, Vol. 1: 181-182. ISBN 978-3-85125-062-6.
[MC 2009 - Joint Meeting of Dreiländertagung and Multinational Congress on Microscopy /9./. Graz (AT), 30.08.2009-04.09.2009]
R&D Projects: GA ČR GP102/09/P543; GA AV ČR IAA100650803
Institutional research plan: CEZ:AV0Z20650511
Keywords : silicon * dopants * PEEM * SEM
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
http://www.univie.ac.at/asem/Graz_MC_09/papers/19923.pdf
Permanent Link: http://hdl.handle.net/11104/0179772 - 7.0308431 - ÚPT 2008 CZ cze K - Conference Paper (Czech conference)
Hovorka, Miloš - Mika, Filip - Frank, Luděk
Možnosti zobrazení dopovaných křemíkových struktur v PEEM a LVSEM.
[Imaging of doped silicon structures using PEEM and LVSEM.]
Mikroskopie 2008. Praha: Československá mikroskopická společnost, 2008 - (Frank, L.), s. 21. ISBN N.
[Mikroskopie 2008. Nové Město na Moravě (CZ), 07.02.2008-08.02.2008]
Institutional research plan: CEZ:AV0Z20650511
Keywords : dopants * PEEM * SEM * silicon
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0160916 - 8.0308215 - ÚPT 2008 RIV CZ eng J - Journal Article
Frank, Luděk
Beamline for Photoemission Spectromicroscopy and Spin Polarized Microscopy with Slow Electrons at CESLAB.
[Beamline pro fotoemisní spektromikroskopii a spinově polarizovanou mikroskopii s pomalými elektrony v CESLAB.]
Materials structure. Roč. 15, č. 1 (2008), s. 111-112. ISSN 1210-8529
Institutional research plan: CEZ:AV0Z20650511
Keywords : CESLAB * beamline * LEEM/PEEM
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0160767 - 9.0308203 - ÚPT 2008 RIV GB eng J - Journal Article
Hovorka, Miloš - Frank, Luděk - Valdaitsev, D. - Nepijko, S. - Elmers, H. - Schönhense, G.
High-pass energy-filtered photoemission electron microscopy imaging of dopants in silicon.
[Studium vlastností dotovaného křemíku pomocí fotoemisní elektronové mikroskopie s využitím energiového filtru.]
Journal of Microscopy. Roč. 230, č. 1 (2008), s. 42-47. ISSN 0022-2720. E-ISSN 1365-2818
R&D Projects: GA ČR GA102/05/2327
Institutional research plan: CEZ:AV0Z20650511
Keywords : dopants * energy-filtered imaging * PEEM * silicon
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.409, year: 2008
Permanent Link: http://hdl.handle.net/11104/0160757 - 10.0050911 - ÚPT 2007 RIV JP eng C - Conference Paper (international conference)
Frank, Luděk - Müllerová, Ilona - Valdaitsev, D. - Nepijko, S. - Gloskovskii, A. - Elmers, H. - Schönhense, G.
Origin of the dopant contrast in PEEM micrographs.
[Původ kontrastu dopantu v mikrosnímcích PEEM.]
The 5th International Conference on LEEM/PEEM. Himeji: JSRRI, 2006, s. 220.
[LEEM/PEEM /5./. Himeji (JP), 15.10.2006-19.10.2006]
Institutional research plan: CEZ:AV0Z20650511
Keywords : PEEM * dopant contrast
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0140941