Search results

  1. 1.
    0574651 - FZÚ 2024 RIV US eng J - Journal Article
    Antunes, V.G. - Rudolph, M. - Kapran, Anna - Hajihoseini, H. - Raadu, M.A. - Brenning, N. - Gudmundsson, J.T. - Lundin, D. - Minea, T.
    Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges.
    Plasma Sources Science & Technology. Roč. 32, č. 7 (2023), č. článku 075016. ISSN 0963-0252. E-ISSN 1361-6595
    Institutional support: RVO:68378271
    Keywords : magnetron sputtering * HiPIMS * ionization region * magnetic field * optical emission spectroscopy
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 3.8, year: 2022
    Method of publishing: Limited access
    https://doi.org/10.1088/1361-6595/ace847
    Permanent Link: https://hdl.handle.net/11104/0349495
     
     
  2. 2.
    0567523 - FZÚ 2023 RIV GB eng J - Journal Article
    Mareš, P. - Dubau, M. - Polášek, J. - Mates, Tomáš - Kozák, T. - Vyskočil, J.
    High deposition rate films prepared by reactive HiPIMS.
    Vacuum. Roč. 191, Sep (2021), č. článku 110329. ISSN 0042-207X. E-ISSN 1879-2715
    R&D Projects: GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760; GA MPO FV30177
    Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR(CZ) StrategieAV21/6
    Program: StrategieAV
    Institutional support: RVO:68378271
    Keywords : reactive magnetron sputtering * HiPIMS * Monte-carlo simulations * deposition rate * sputtering yield
    OECD category: Coating and films
    Impact factor: 4.110, year: 2021
    Method of publishing: Limited access
    https://doi.org/10.1016/j.vacuum.2021.110329
    Permanent Link: https://hdl.handle.net/11104/0338777
     
     
  3. 3.
    0567078 - FZÚ 2024 RIV US eng J - Journal Article
    Kapran, Anna - Antunes, V.G. - Hubička, Zdeněk - Ballage, C. - Minea, T.
    Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths.
    Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 41, č. 1 (2023), č. článku 013003. ISSN 0734-2101. E-ISSN 1520-8559
    R&D Projects: GA ČR(CZ) GA21-04477S; GA MŠMT(CZ) EF16_019/0000760
    Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
    Institutional support: RVO:68378271
    Keywords : HiPIMS * magnetron * ionized flux fraction * unbalanced magnetic field
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 2.9, year: 2022
    Method of publishing: Limited access
    https://doi.org/10.1116/6.0002309
    Permanent Link: https://hdl.handle.net/11104/0342037
     
     
  4. 4.
    0566773 - FZÚ 2023 RIV US eng J - Journal Article
    Hrubantová, Aneta - Hippler, Rainer - Wulff, H. - Čada, Martin - Gedeon, O. - Jiříček, Petr - Houdková, Jana - Olejníček, Jiří - Nepomniashchaia, Natalia - Helm, C.A. - Hubička, Zdeněk
    Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering.
    Journal of Applied Physics. Roč. 132, č. 21 (2022), č. článku 215301. ISSN 0021-8979. E-ISSN 1089-7550
    R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
    Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
    Research Infrastructure: CzechNanoLab - 90110
    Institutional support: RVO:68378271
    Keywords : HiPIMS * sputtering * photoelectrochemical activity * FTO glass * film properties
    OECD category: Coating and films
    Impact factor: 3.2, year: 2022
    Method of publishing: Open access
    Permanent Link: https://hdl.handle.net/11104/0338068
    FileDownloadSizeCommentaryVersionAccess
    0566773.pdf03.5 MBCC licencePublisher’s postprintopen-access
     
     
  5. 5.
    0562105 - FZÚ 2023 RIV CH eng J - Journal Article
    Vyskočil, J. - Mareš, P. - Hubička, Zdeněk - Čada, Martin - Mates, Tomáš
    Hybrid HiPIMS + controlled pulsed arc for deposition of hard coatings.
    Surface and Coatings Technology. Roč. 446, Sep (2022), č. článku 128765. ISSN 0257-8972
    R&D Projects: GA MPO FV30177
    Institutional support: RVO:68378271
    Keywords : HiPIMS * arc discharge * plasma * sputtering * cathodic arc evaporation
    OECD category: Coating and films
    Impact factor: 5.4, year: 2022
    Method of publishing: Limited access
    https://doi.org/10.1016/j.surfcoat.2022.128765
    Permanent Link: https://hdl.handle.net/11104/0334526
     
     
  6. 6.
    0560961 - FZÚ 2023 RIV NL eng J - Journal Article
    Prysiazhnyi, V. - Kratochvíl, Jan - Kaftan, D. - Čtvrtlík, R. - Straňák, Vítězslav
    Growth of hard nanostructured ZrN surface induced by copper nanoparticles.
    Applied Surface Science. Roč. 562, Oct (2021), č. článku 150230. ISSN 0169-4332. E-ISSN 1873-5584
    R&D Projects: GA MŠMT(CZ) EF16_019/0000760
    Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
    Institutional support: RVO:68378271
    Keywords : hard nanostructures * Roughness gradient * Cu nanoparticles * gas aggregation source * seed-like growth * ZrN * HiPIMS
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 7.392, year: 2021
    Method of publishing: Open access
    Permanent Link: https://hdl.handle.net/11104/0333730
    FileDownloadSizeCommentaryVersionAccess
    0560961.pdf15.2 MBCC licencePublisher’s postprintopen-access
     
     
  7. 7.
    0552303 - FZÚ 2022 RIV US eng J - Journal Article
    Hippler, Rainer - Čada, Martin - Hubička, Zdeněk
    Direct current and high power impulse magnetron sputtering discharges with a positively biased anode.
    Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 39, č. 4 (2021), č. článku 043007. ISSN 0734-2101. E-ISSN 1520-8559
    R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA19-00579S
    Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
    Institutional support: RVO:68378271
    Keywords : magnetron * mass spectrometry * Langmuir probe * anode bias * HiPIMS
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 3.234, year: 2021
    Method of publishing: Open access
    Permanent Link: http://hdl.handle.net/11104/0327435
    FileDownloadSizeCommentaryVersionAccess
    0552303.pdf14.6 MBCC LicencePublisher’s postprintopen-access
     
     
  8. 8.
    0552199 - FZÚ 2022 RIV CH eng J - Journal Article
    Sezemsky, P. - Burnat, D. - Kratochvíl, J. - Wulff, H. - Kruth, A. - Lechowicz, K. - Janik, M. - Bogdanowicz, R. - Čada, Martin - Hubička, Zdeněk - Niedzialkowski, P. - Bialobrzeska, W. - Straňák, V. - Smietana, M.
    Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems.
    Sensors and Actuators B - Chemical. Roč. 343, Sep (2021), č. článku 130173. E-ISSN 0925-4005
    Institutional support: RVO:68378271
    Keywords : Indium tin oxide * sensor * optical sensing * HiPIMS * sputtering
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 9.221, year: 2021
    Method of publishing: Open access
    Permanent Link: http://hdl.handle.net/11104/0327330
    FileDownloadSizeCommentaryVersionAccess
    0552199.pdf24.4 MBCC LicencePublisher’s postprintopen-access
     
     
  9. 9.
    0552174 - FZÚ 2022 RIV CZ cze L - Prototype, f. module
    Čada, Martin - Tvarog, Drahoslav - Hubička, Zdeněk - Mareš, P. - Dubau, M. - Vyskočil, J.
    Zdroj pro technologii HIPIMS s obloukovým odpařováním.
    [Source for HiPIMS technology with arc evaporation.]
    Internal code: FVHA/FZU/2021 ; 2021
    Technical parameters: HiPIMS zdroj plazmatu–pulzní frekvence: 10-1 000 Hz HiPIMS zdroj plazmatu–doba pulzu: 30 -1 000 µs Zdroj plazmového oblouku–typický proud: > 10 A/cm2 Zdroj plazmového oblouku–max. napětí: 2 000 V
    Economic parameters: Laboratorní zařízení nezbytné pro další aplikovaný výzkum
    R&D Projects: GA MPO FV30177
    Institutional support: RVO:68378271
    Keywords : sputtering * HiPIMS * arc * magnetron * DLC
    OECD category: Fluids and plasma physics (including surface physics)
    Permanent Link: http://hdl.handle.net/11104/0327317
     
     
  10. 10.
    0541687 - FZÚ 2022 RIV CH eng J - Journal Article
    Hippler, Rainer - Čada, Martin - Kšírová, Petra - Olejníček, Jiří - Jiříček, Petr - Houdková, Jana - Wulff, H. - Kruth, A. - Helm, C.A. - Hubička, Zdeněk
    Deposition of cobalt oxide films by reactive pulsed magnetron sputtering.
    Surface and Coatings Technology. Roč. 405, Jan (2021), č. článku 126590. ISSN 0257-8972
    R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA19-00579S
    Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR(CZ) StrategieAV21/6
    Program: StrategieAV
    Institutional support: RVO:68378271
    Keywords : cobalt oxide film * pulsed magnetron sputtering * HiPIMS * Raman spectroscopy * XPS * XRD * electrical resistivity
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 4.865, year: 2021
    Method of publishing: Limited access
    https://doi.org/10.1016/j.surfcoat.2020.126590
    Permanent Link: http://hdl.handle.net/11104/0319218
     
     

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.