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- 1.0523531 - ÚFE 2020 RIV cze P1 - User Module
Mrázek, Jan
Koloidní difuzní zdroj bóru pro přípravu dotovaného křemíku typu P.
[Colloidal boron diffusion source for the preparation of doped P-type silicon.]
2019. Owner: Ústav fotoniky a elektroniky AV ČR, v. v. i. Date of the utility model acceptance: 30.09.2019. Utility model number: 33261
R&D Projects: GA MPO(CZ) FV30151
Institutional support: RVO:67985882
Keywords : semiconductor * boron * colloid
OECD category: Electrical and electronic engineering
Permanent Link: http://hdl.handle.net/11104/0307887File Download Size Commentary Version Access UFE 0523531.pdf 4 127.7 KB Publisher’s postprint open-access - 2.0523530 - ÚFE 2020 RIV cze P1 - User Module
Mrázek, Jan
Koloidní difuzní zdroj fosforu pro přípravu dotovaného křemíku typu N.
[Colloidal diffuse source of phosphorus for preparing doped of the type N silicon.]
2019. Owner: Ústav fotoniky a elektroniky AV ČR, v. v. i. Date of the utility model acceptance: 10.06.2019. Utility model number: 32924
R&D Projects: GA MPO(CZ) FV30151
Institutional support: RVO:67985882
Keywords : semiconductor * phosphorus * colloid
OECD category: Electrical and electronic engineering
Permanent Link: http://hdl.handle.net/11104/0307886File Download Size Commentary Version Access UFE 0523530.pdf 5 136.8 KB Publisher’s postprint open-access