Search results
- 1.0535135 - ÚACH 2021 US eng A - Abstract
Cheung, K. - Goronzy, D. P. - Stemer, D. - Zhao, CH. - Young, T. - Belling, J. - Baše, Tomáš - Andrews, A. - Weiss, P.
Advances in chemical lift-off lithography.
Abstracts of papers - American Chemical Society. Roč. 258, AUG (2019), č. článku 277-ANYL. ISSN 0065-7727.
[ACS Fall National Meeting and Exposition. 25.08.2019-29.08.2019, San Diego]
Institutional support: RVO:61388980
Keywords : lift-off lithography
OECD category: Inorganic and nuclear chemistry
Permanent Link: http://hdl.handle.net/11104/0313227 - 2.0490866 - ÚACH 2019 RIV US eng A - Abstract
Goronzy, D. P. - Avery, E. - Gallup, N. - Staněk, Jan - Macháček, Jan - Baše, Tomáš - Houk, K. - Weiss, P.
Reactivity of confined carboxylic acids in thin films.
Abstracts of papers - American Chemical Society. Roč. 255, MAR (2018), č. článku 686. ISSN 0065-7727.
[National Meeting and Exposition of the American-Chemical-Society (ACS) - Nexus of Food, Energy, and Water /255./. 18.03.2018-22.03.2018, New Orleans]
Institutional support: RVO:61388980
Keywords : carboxylic acids
OECD category: Inorganic and nuclear chemistry
https://tpa.acs.org/abstract/acsnm255-2874048/reactivity-of-confined-carboxylic-acids-in-thin-films
Permanent Link: http://hdl.handle.net/11104/0292714