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0552189 - FZÚ 2022 RIV US eng J - Journal Article
Tvarog, Drahoslav - Olejníček, Jiří - Kratochvíl, Jiří - Kšírová, Petra - Poruba, A. - Hubička, Zdeněk - Čada, Martin
Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma.
Journal of Applied Physics. Roč. 130, č. 1 (2021), č. článku 013301. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760; GA TA ČR(CZ) TM01000039; GA TA ČR TF03000025
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : microwave surfatron * low-temperature plasma * ALD * TiO₂ * plasma diagnostics
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.877, year: 2021
Method of publishing: Limited access
https://doi.org/10.1063/5.0046829
Permanent Link: http://hdl.handle.net/11104/0327391