Search results
- 1.0555890 - FZÚ 2023 RIV GB eng J - Journal Article
Olejníček, Jiří - Hrubantová, Aneta - Volfová, Lenka - Dvořáková, Michaela - Kohout, Michal - Tvarog, Drahoslav - Gedeon, O. - Wulff, H. - Hippler, Rainer - Hubička, Zdeněk
WO3 and WO3-x thin films prepared by DC hollow cathode discharge.
Vacuum. Roč. 195, Jan (2022), č. článku 110679. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S; GA MPO FV20580
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : tungsten oxide * WO3 * hollow cathode discharge * sputtering * thin films
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2021.110679
Permanent Link: http://hdl.handle.net/11104/0330352 - 2.0552189 - FZÚ 2022 RIV US eng J - Journal Article
Tvarog, Drahoslav - Olejníček, Jiří - Kratochvíl, Jiří - Kšírová, Petra - Poruba, A. - Hubička, Zdeněk - Čada, Martin
Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma.
Journal of Applied Physics. Roč. 130, č. 1 (2021), č. článku 013301. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760; GA TA ČR(CZ) TM01000039; GA TA ČR TF03000025
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : microwave surfatron * low-temperature plasma * ALD * TiO2 * plasma diagnostics
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.877, year: 2021
Method of publishing: Limited access
https://doi.org/10.1063/5.0046829
Permanent Link: http://hdl.handle.net/11104/0327391 - 3.0531792 - FZÚ 2021 RIV CH eng J - Journal Article
Hubička, Zdeněk - Zlámal, M. - Olejníček, Jiří - Tvarog, Drahoslav - Čada, Martin - Krýsa, J.
Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system.
Coatings. Roč. 10, č. 3 (2020), s. 1-14, č. článku 232. E-ISSN 2079-6412
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA17-20008S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : photocathode film * r-HiPIMS plus ECWR plasma * r-HiPIMS plasma * copper iron oxide * photocurrent
OECD category: Materials engineering
Impact factor: 2.881, year: 2020
Method of publishing: Open access
Permanent Link: http://hdl.handle.net/11104/0310408File Download Size Commentary Version Access 0531792.pdf 0 3.6 MB CC licence Publisher’s postprint open-access