Search results
- 1.0559444 - ÚPT 2023 RIV US eng J - Journal Article
Schánilec, V. - Brunn, Ondřej - Horáček, Miroslav - Krátký, Stanislav - Meluzín, Petr - Šikola, T. - Canals, B. - Rougemaille, N.
Approaching the Topological Low-Energy Physics of the F Model in a Two-Dimensional Magnetic Lattice.
Physical Review Letters. Roč. 129, č. 2 (2022), č. článku 027202. ISSN 0031-9007. E-ISSN 1079-7114
Research Infrastructure: CzechNanoLab - 90110
Institutional support: RVO:68081731
Keywords : F-model * artificial spin ice * micromagnetism
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 8.6, year: 2022
Method of publishing: Limited access
https://journals.aps.org/prl/abstract/10.1103/PhysRevLett.129.027202
Permanent Link: https://hdl.handle.net/11104/0333413 - 2.0501458 - ÚPT 2020 RIV SK eng J - Journal Article
Kolařík, Vladimír - Horáček, Miroslav - Knápek, Alexandr - Krátký, Stanislav - Matějka, Milan - Meluzín, Petr
Spiral arrangement: From nanostructures to packaging.
Journal of Electrical Engineering - Elektrotechnický časopis. Roč. 70, č. 1 (2019), s. 74-77. ISSN 1335-3632. E-ISSN 1339-309X
R&D Projects: GA MPO FV10618; GA TA ČR TG03010046; GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : electron beam lithography * phyllotaxis * spiral arrangement * parastichy
OECD category: Electrical and electronic engineering
Impact factor: 0.686, year: 2019
Method of publishing: Open access
https://content.sciendo.com/view/journals/jee/70/1/article-p74.xml?lang=en
Permanent Link: http://hdl.handle.net/11104/0293484 - 3.0477782 - ÚPT 2018 RIV NL eng J - Journal Article
Krátký, Stanislav - Kolařík, Vladimír - Horáček, Miroslav - Meluzín, Petr - Král, Stanislav
Combined e-beam lithography using different energies.
Microelectronic Engineering. Roč. 177, JUN (2017), s. 30-34. ISSN 0167-9317. E-ISSN 1873-5568
R&D Projects: GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : grayscale e-beam lithography * mix and match process * absorbed energy density * resist sensitivity * micro-optical elements
OECD category: Nano-processes (applications on nano-scale)
Impact factor: 2.020, year: 2017
Permanent Link: http://hdl.handle.net/11104/0274006 - 4.0452395 - ÚPT 2016 RIV CZ cze J - Journal Article
Krátký, Stanislav - Urbánek, Michal - Chlumská, Jana - Matějka, Milan - Meluzín, Petr - Kolařík, Vladimír - Horáček, Miroslav
Kombinace elektronové litografie s gaussovským svazkem a s proměnným tvarovaným svazkem.
[Combination of electron lithography with Gaussian and shaped beams.]
Jemná mechanika a optika. Roč. 60, č. 1 (2015), s. 10-13. ISSN 0447-6441
R&D Projects: GA MŠMT(CZ) LO1212
Institutional support: RVO:68081731
Keywords : e-beam writer * Gausssian beam * variable shaped beam
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0253409