Search results

  1. 1.
    0618988 - ÚPT 2025 RIV CZ cze O - Others
    Matějka, Milan - Brunn, Ondřej
    Aplikační dokument pro Kalibrační standard s přesnou 3D morfologickou strukturou.
    [Application document for Calibration Standard with precise 3D morphological structure.]
    2024
    R&D Projects: GA TA ČR(CZ) FW03010504
    Institutional support: RVO:68081731
    Keywords : morphological accuracy * crystallographic etching
    OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
    Permanent Link: https://hdl.handle.net/11104/0365781
     
  2. 2.
    0618987 - ÚPT 2025 RIV CZ cze O - Others
    Matějka, Milan - Brunn, Ondřej
    Aplikační dokument pro Kalibrační standard s mikro reliéfní kalibrační strukturou zaznamenané v tenké vrstvě.
    [Application document for Calibration standard with micro relief calibration structure prepared in a thin layer.]
    2024
    R&D Projects: GA TA ČR(CZ) FW03010504
    Institutional support: RVO:68081731
    Keywords : calibration chip * microstructure * magnetic chip
    OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
    Permanent Link: https://hdl.handle.net/11104/0365782
     
  3. 3.
    0538397 - ÚPT 2021 RIV CZ cze O - Others
    Matějka, Milan - Chlumská, Jana - Kolařík, Vladimír - Lalinský, Ondřej - Bábor, P. - Nejezchleb, K. - Horodyský, P. - Himics, D.
    Nové monokrystaly pro elektronovou mikroskopii.
    [New single crystals for electron microscopy.]
    2020
    R&D Projects: GA TA ČR(CZ) TN01000008
    Institutional support: RVO:68081731
    Keywords : scintillator * garnet * silicate * microlithography * cathodoluminescence * contamination * SIMS * LEIS * ITO
    OECD category: Electrical and electronic engineering
    Permanent Link: http://hdl.handle.net/11104/0316202
     
  4. 4.
    0508977 - ÚPT 2020 RIV CZ cze O - Others
    Matějka, Milan - Kolařík, Vladimír - Sháněl, O. - Schneider, M.
    Technologie pro přípravu fázových destiček.
    [Phase Plates Preparation Technologies.]
    2019
    R&D Projects: GA TA ČR(CZ) TN01000008
    Institutional support: RVO:68081731
    Keywords : e–beam lithography * electron microscopy * phase plates * membranes
    OECD category: Nano-processes (applications on nano-scale)
    Permanent Link: http://hdl.handle.net/11104/0299799
     


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