Search results
- 1.0570569 - ÚPT 2023 RIV CZ cze J - Journal Article
Matějka, Milan - Kolařík, Vladimír - Pavlačík, P. - Škoda, D. - Brunn, Ondřej - Sadílek, Jakub
Difraktivní optický element pro realizaci svítícího bodu v záměrném kříži pro puškohledovou optiku.
[Diffractive optical element for creating a illuminated point in a reticle for rifle scopes.]
Jemná mechanika a optika. Roč. 68, č. 4 (2023), s. 87-90. ISSN 0447-6441
R&D Projects: GA MPO(CZ) FV40197
Institutional support: RVO:68081731
Keywords : diffractive optical elements * electron beam lithography * reactive ion etching * sports optics
OECD category: Optics (including laser optics and quantum optics)
Method of publishing: Limited access
Result website:
https://jmo.fzu.cz/sites/jmo.fzu.cz/files/oldweb/2023/2023-04/jmo_23_04_obsah.pdf
Permanent Link: https://hdl.handle.net/11104/0341873 - 2.0549311 - ÚPT 2022 RIV CH eng J - Journal Article
Šimonová, L. - Matějka, Milan - Knápek, Alexandr - Králík, Tomáš - Pokorná, Zuzana - Mika, Filip - Fořt, Tomáš - Man, O. - Škarvada, P. - Otáhal, A. - Čudek, P.
Nanostructures for achieving selective properties of a thermophotovoltaic emitter.
Nanomaterials. Roč. 11, č. 9 (2021), č. článku 2443. ISSN 2079-4991. E-ISSN 2079-4991
Institutional support: RVO:68081731
Keywords : thermophotovoltaics * selective emitters * nanostructures * reactive ion etching * emissivity * electron beam lithography
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 5.719, year: 2021 ; AIS: 0.738, rok: 2021
Method of publishing: Open access
Result website:
https://www.mdpi.com/2079-4991/11/9/2443DOI: https://doi.org/10.3390/nano11092443
Permanent Link: http://hdl.handle.net/11104/0325334 - 3.0543063 - ÚPT 2022 RIV NL eng J - Journal Article
Řiháček, Tomáš - Horák, M. - Schachinger, T. - Mika, Filip - Matějka, Milan - Krátký, Stanislav - Fořt, Tomáš - Radlička, Tomáš - Johnson, C. W. - Novák, L. - Seďa, B. - McMorran, B.J. - Müllerová, Ilona
Beam shaping and probe characterization in the scanning electron microscope.
Ultramicroscopy. Roč. 225, June (2021), č. článku 113268. ISSN 0304-3991. E-ISSN 1879-2723
R&D Projects: GA TA ČR(CZ) TN01000008
Institutional support: RVO:68081731
Keywords : Electron diffraction * SEM * Electron beam structuring * Spot shape measurement * Electron vortex beam
OECD category: Particles and field physics
Impact factor: 2.994, year: 2021 ; AIS: 0.857, rok: 2021
Method of publishing: Open access
Result website:
https://www.sciencedirect.com/science/article/pii/S0304399121000589DOI: https://doi.org/10.1016/j.ultramic.2021.113268
Permanent Link: http://hdl.handle.net/11104/0320365 - 4.0535207 - ÚPT 2021 RIV CZ cze J - Journal Article
Knápek, Alexandr - Horáček, Miroslav - Krátký, Stanislav - Matějka, Milan - Brunn, Ondřej - Burda, Daniel - Kolařík, Vladimír
Vlastnosti kvaziperiodických spirálových mikrostruktur.
[Properties of quasiperiodic spiral microstrictures.]
Jemná mechanika a optika. Roč. 65, č. 6 (2020), s. 175-178. ISSN 0447-6441
R&D Projects: GA MV(CZ) VI20192022147
Institutional support: RVO:68081731
Keywords : planar phyllotactit model * electron beam lithography * diffractive optically variable image device
OECD category: Optics (including laser optics and quantum optics)
Method of publishing: Limited access
Result website:
https://jmo.fzu.cz/sites/jmo.fzu.cz/files/oldweb/2020/2020-06/jmo_20_06_obsah.pdf
Permanent Link: http://hdl.handle.net/11104/0313290 - 5.0532029 - ÚPT 2021 RIV JO eng J - Journal Article
Knápek, Alexandr - Drozd, Michal - Matějka, Milan - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír
Automated System for Optical Inspection of Defects in Resist-coated Non-patterned Wafer.
Jordan Journal of Physics. Roč. 13, č. 2 (2020), s. 93-100. ISSN 1994-7607. E-ISSN 1994-7615
R&D Projects: GA MPO FV10618
Institutional support: RVO:68081731
Keywords : optical inspection * resist layer * non-patterned wafer * quality control
OECD category: Automation and control systems
Method of publishing: Open access
Result website:
http://journals.yu.edu.jo/jjp/JJPIssues/Vol13No2pdf2020/1.html
DOI: https://doi.org/10.47011/13.2.1
Permanent Link: http://hdl.handle.net/11104/0310631 - 6.0531987 - ÚPT 2021 RIV CH eng J - Journal Article
Knápek, Alexandr - Dallaev, R. - Burda, Daniel - Sobola, D. - Allaham, M. M. - Horáček, Miroslav - Kašpar, P. - Matějka, Milan - Mousa, M. S.
Field Emission Properties of Polymer Graphite Tips Prepared by Membrane Electrochemical Etching.
Nanomaterials. Roč. 10, č. 7 (2020), č. článku 1294. ISSN 2079-4991. E-ISSN 2079-4991
R&D Projects: GA MV(CZ) VI20192022147
Institutional support: RVO:68081731
Keywords : polymer graphite tip * electrochemical etching * field emission microscopy
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 5.076, year: 2020 ; AIS: 0.756, rok: 2020
Method of publishing: Open access
Result website:
https://www.mdpi.com/2079-4991/10/7/1294DOI: https://doi.org/10.3390/nano10071294
Permanent Link: http://hdl.handle.net/11104/0310599 - 7.0525191 - ÚPT 2021 RIV SK eng J - Journal Article
Matějka, Milan - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
Functional nano-structuring of thin silicon nitride membranes.
Journal of Electrical Engineering - Elektrotechnický časopis. Roč. 71, č. 2 (2020), s. 127-130. ISSN 1335-3632. E-ISSN 1339-309X
R&D Projects: GA TA ČR(CZ) TN01000008; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : membrane * nano optical device * electron optics * electron beam lithography * silicon nitride * reactive ion etching * silicon etching * microfabrication
OECD category: Nano-processes (applications on nano-scale)
Impact factor: 0.647, year: 2020 ; AIS: 0.127, rok: 2020
Method of publishing: Open access
Result website:
https://content.sciendo.com/view/journals/jee/71/2/article-p127.xmlDOI: https://doi.org/10.2478/jee-2020-0019
Permanent Link: http://hdl.handle.net/11104/0309382 - 8.0501458 - ÚPT 2020 RIV SK eng J - Journal Article
Kolařík, Vladimír - Horáček, Miroslav - Knápek, Alexandr - Krátký, Stanislav - Matějka, Milan - Meluzín, Petr
Spiral arrangement: From nanostructures to packaging.
Journal of Electrical Engineering - Elektrotechnický časopis. Roč. 70, č. 1 (2019), s. 74-77. ISSN 1335-3632. E-ISSN 1339-309X
R&D Projects: GA MPO FV10618; GA TA ČR TG03010046; GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : electron beam lithography * phyllotaxis * spiral arrangement * parastichy
OECD category: Electrical and electronic engineering
Impact factor: 0.686, year: 2019 ; AIS: 0.09, rok: 2019
Method of publishing: Open access
Result website:
https://content.sciendo.com/view/journals/jee/70/1/article-p74.xml?lang=en
Permanent Link: http://hdl.handle.net/11104/0293484 - 9.0454665 - ÚPT 2016 RIV NL eng J - Journal Article
Bok, Jan - Horáček, Miroslav - Kolařík, Vladimír - Urbánek, Michal - Matějka, Milan - Krzyžánek, Vladislav
Measurements of current density distribution in shaped e-beam writers.
Microelectronic Engineering. Roč. 149, JAN 5 (2016), s. 117-124. ISSN 0167-9317. E-ISSN 1873-5568
R&D Projects: GA ČR(CZ) GA14-20012S; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : shaped e-beam writer * electron beam * current density
Subject RIV: JB - Sensors, Measurment, Regulation
Impact factor: 1.806, year: 2016 ; AIS: 0.333, rok: 2016
DOI: https://doi.org/10.1016/j.mee.2015.09.013
Permanent Link: http://hdl.handle.net/11104/0255378 - 10.0452395 - ÚPT 2016 RIV CZ cze J - Journal Article
Krátký, Stanislav - Urbánek, Michal - Chlumská, Jana - Matějka, Milan - Meluzín, Petr - Kolařík, Vladimír - Horáček, Miroslav
Kombinace elektronové litografie s gaussovským svazkem a s proměnným tvarovaným svazkem.
[Combination of electron lithography with Gaussian and shaped beams.]
Jemná mechanika a optika. Roč. 60, č. 1 (2015), s. 10-13. ISSN 0447-6441
R&D Projects: GA MŠMT(CZ) LO1212
Institutional support: RVO:68081731
Keywords : e-beam writer * Gausssian beam * variable shaped beam
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0253409