Search results

  1. 1.
    0570569 - ÚPT 2023 RIV CZ cze J - Journal Article
    Matějka, Milan - Kolařík, Vladimír - Pavlačík, P. - Škoda, D. - Brunn, Ondřej - Sadílek, Jakub
    Difraktivní optický element pro realizaci svítícího bodu v záměrném kříži pro puškohledovou optiku.
    [Diffractive optical element for creating a illuminated point in a reticle for rifle scopes.]
    Jemná mechanika a optika. Roč. 68, č. 4 (2023), s. 87-90. ISSN 0447-6441
    R&D Projects: GA MPO(CZ) FV40197
    Institutional support: RVO:68081731
    Keywords : diffractive optical elements * electron beam lithography * reactive ion etching * sports optics
    OECD category: Optics (including laser optics and quantum optics)
    Method of publishing: Limited access
    https://jmo.fzu.cz/sites/jmo.fzu.cz/files/oldweb/2023/2023-04/jmo_23_04_obsah.pdf
    Permanent Link: https://hdl.handle.net/11104/0341873
     
     
  2. 2.
    0549311 - ÚPT 2022 RIV CH eng J - Journal Article
    Šimonová, L. - Matějka, Milan - Knápek, Alexandr - Králík, Tomáš - Pokorná, Zuzana - Mika, Filip - Fořt, Tomáš - Man, O. - Škarvada, P. - Otáhal, A. - Čudek, P.
    Nanostructures for achieving selective properties of a thermophotovoltaic emitter.
    Nanomaterials. Roč. 11, č. 9 (2021), č. článku 2443. E-ISSN 2079-4991
    Institutional support: RVO:68081731
    Keywords : thermophotovoltaics * selective emitters * nanostructures * reactive ion etching * emissivity * electron beam lithography
    OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
    Impact factor: 5.719, year: 2021
    Method of publishing: Open access
    https://www.mdpi.com/2079-4991/11/9/2443
    Permanent Link: http://hdl.handle.net/11104/0325334
     
     
  3. 3.
    0543063 - ÚPT 2022 RIV NL eng J - Journal Article
    Řiháček, Tomáš - Horák, M. - Schachinger, T. - Mika, Filip - Matějka, Milan - Krátký, Stanislav - Fořt, Tomáš - Radlička, Tomáš - Johnson, C. W. - Novák, L. - Seďa, B. - McMorran, B.J. - Müllerová, Ilona
    Beam shaping and probe characterization in the scanning electron microscope.
    Ultramicroscopy. Roč. 225, June (2021), č. článku 113268. ISSN 0304-3991. E-ISSN 1879-2723
    R&D Projects: GA TA ČR(CZ) TN01000008
    Institutional support: RVO:68081731
    Keywords : Electron diffraction * SEM * Electron beam structuring * Spot shape measurement * Electron vortex beam
    OECD category: Particles and field physics
    Impact factor: 2.994, year: 2021
    Method of publishing: Open access
    https://www.sciencedirect.com/science/article/pii/S0304399121000589
    Permanent Link: http://hdl.handle.net/11104/0320365
     
     
  4. 4.
    0535207 - ÚPT 2021 RIV CZ cze J - Journal Article
    Knápek, Alexandr - Horáček, Miroslav - Krátký, Stanislav - Matějka, Milan - Brunn, Ondřej - Burda, Daniel - Kolařík, Vladimír
    Vlastnosti kvaziperiodických spirálových mikrostruktur.
    [Properties of quasiperiodic spiral microstrictures.]
    Jemná mechanika a optika. Roč. 65, č. 6 (2020), s. 175-178. ISSN 0447-6441
    R&D Projects: GA MV(CZ) VI20192022147
    Institutional support: RVO:68081731
    Keywords : planar phyllotactit model * electron beam lithography * diffractive optically variable image device
    OECD category: Optics (including laser optics and quantum optics)
    Method of publishing: Limited access
    https://jmo.fzu.cz/sites/jmo.fzu.cz/files/oldweb/2020/2020-06/jmo_20_06_obsah.pdf
    Permanent Link: http://hdl.handle.net/11104/0313290
     
     
  5. 5.
    0532029 - ÚPT 2021 RIV JO eng J - Journal Article
    Knápek, Alexandr - Drozd, Michal - Matějka, Milan - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír
    Automated System for Optical Inspection of Defects in Resist-coated Non-patterned Wafer.
    Jordan Journal of Physics. Roč. 13, č. 2 (2020), s. 93-100. ISSN 1994-7607. E-ISSN 1994-7615
    R&D Projects: GA MPO FV10618
    Institutional support: RVO:68081731
    Keywords : optical inspection * resist layer * non-patterned wafer * quality control
    OECD category: Automation and control systems
    Method of publishing: Open access
    http://journals.yu.edu.jo/jjp/JJPIssues/Vol13No2pdf2020/1.html
    Permanent Link: http://hdl.handle.net/11104/0310631
     
     
  6. 6.
    0531987 - ÚPT 2021 RIV CH eng J - Journal Article
    Knápek, Alexandr - Dallaev, R. - Burda, Daniel - Sobola, D. - Allaham, M.M. - Horáček, Miroslav - Kašpar, P. - Matějka, Milan - Mousa, M. S.
    Field Emission Properties of Polymer Graphite Tips Prepared by Membrane Electrochemical Etching.
    Nanomaterials. Roč. 10, č. 7 (2020), č. článku 1294. E-ISSN 2079-4991
    R&D Projects: GA MV(CZ) VI20192022147
    Institutional support: RVO:68081731
    Keywords : polymer graphite tip * electrochemical etching * field emission microscopy
    OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
    Impact factor: 5.076, year: 2020
    Method of publishing: Open access
    https://www.mdpi.com/2079-4991/10/7/1294
    Permanent Link: http://hdl.handle.net/11104/0310599
     
     
  7. 7.
    0525191 - ÚPT 2021 RIV SK eng J - Journal Article
    Matějka, Milan - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
    Functional nano-structuring of thin silicon nitride membranes.
    Journal of Electrical Engineering - Elektrotechnický časopis. Roč. 71, č. 2 (2020), s. 127-130. ISSN 1335-3632. E-ISSN 1339-309X
    R&D Projects: GA TA ČR(CZ) TN01000008; GA MŠMT ED0017/01/01
    Institutional support: RVO:68081731
    Keywords : membrane * nano optical device * electron optics * electron beam lithography * silicon nitride * reactive ion etching * silicon etching * microfabrication
    OECD category: Nano-processes (applications on nano-scale)
    Impact factor: 0.647, year: 2020
    Method of publishing: Open access
    https://content.sciendo.com/view/journals/jee/71/2/article-p127.xml
    Permanent Link: http://hdl.handle.net/11104/0309382
     
     
  8. 8.
    0501458 - ÚPT 2020 RIV SK eng J - Journal Article
    Kolařík, Vladimír - Horáček, Miroslav - Knápek, Alexandr - Krátký, Stanislav - Matějka, Milan - Meluzín, Petr
    Spiral arrangement: From nanostructures to packaging.
    Journal of Electrical Engineering - Elektrotechnický časopis. Roč. 70, č. 1 (2019), s. 74-77. ISSN 1335-3632. E-ISSN 1339-309X
    R&D Projects: GA MPO FV10618; GA TA ČR TG03010046; GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
    Institutional support: RVO:68081731
    Keywords : electron beam lithography * phyllotaxis * spiral arrangement * parastichy
    OECD category: Electrical and electronic engineering
    Impact factor: 0.686, year: 2019
    Method of publishing: Open access
    https://content.sciendo.com/view/journals/jee/70/1/article-p74.xml?lang=en
    Permanent Link: http://hdl.handle.net/11104/0293484
     
     
  9. 9.
    0454665 - ÚPT 2016 RIV NL eng J - Journal Article
    Bok, Jan - Horáček, Miroslav - Kolařík, Vladimír - Urbánek, Michal - Matějka, Milan - Krzyžánek, Vladislav
    Measurements of current density distribution in shaped e-beam writers.
    Microelectronic Engineering. Roč. 149, JAN 5 (2016), s. 117-124. ISSN 0167-9317. E-ISSN 1873-5568
    R&D Projects: GA ČR(CZ) GA14-20012S; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
    Institutional support: RVO:68081731
    Keywords : shaped e-beam writer * electron beam * current density
    Subject RIV: JB - Sensors, Measurment, Regulation
    Impact factor: 1.806, year: 2016
    Permanent Link: http://hdl.handle.net/11104/0255378
     
     
  10. 10.
    0452395 - ÚPT 2016 RIV CZ cze J - Journal Article
    Krátký, Stanislav - Urbánek, Michal - Chlumská, Jana - Matějka, Milan - Meluzín, Petr - Kolařík, Vladimír - Horáček, Miroslav
    Kombinace elektronové litografie s gaussovským svazkem a s proměnným tvarovaným svazkem.
    [Combination of electron lithography with Gaussian and shaped beams.]
    Jemná mechanika a optika. Roč. 60, č. 1 (2015), s. 10-13. ISSN 0447-6441
    R&D Projects: GA MŠMT(CZ) LO1212
    Institutional support: RVO:68081731
    Keywords : e-beam writer * Gausssian beam * variable shaped beam
    Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
    Permanent Link: http://hdl.handle.net/11104/0253409
     
     

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