Search results
- 1.0464577 - ÚPT 2017 RIV NL eng J - Journal Article
Knápek, Alexandr - Sobola, D. - Tománek, P. - Pokorná, Zuzana - Urbánek, Michal
Field emission from the surface of highly ordered pyrolytic graphite.
Applied Surface Science. Roč. 395, FEB 15 (2017), s. 157-161. ISSN 0169-4332. E-ISSN 1873-5584
R&D Projects: GA TA ČR(CZ) TE01020118
Institutional support: RVO:68081731
Keywords : field emission * HOPG * scanning electron microscopy * scanning near-field optical microscopy
OECD category: Nano-processes (applications on nano-scale)
Impact factor: 4.439, year: 2017
Permanent Link: http://hdl.handle.net/11104/0268531 - 2.0454665 - ÚPT 2016 RIV NL eng J - Journal Article
Bok, Jan - Horáček, Miroslav - Kolařík, Vladimír - Urbánek, Michal - Matějka, Milan - Krzyžánek, Vladislav
Measurements of current density distribution in shaped e-beam writers.
Microelectronic Engineering. Roč. 149, JAN 5 (2016), s. 117-124. ISSN 0167-9317. E-ISSN 1873-5568
R&D Projects: GA ČR(CZ) GA14-20012S; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : shaped e-beam writer * electron beam * current density
Subject RIV: JB - Sensors, Measurment, Regulation
Impact factor: 1.806, year: 2016
Permanent Link: http://hdl.handle.net/11104/0255378 - 3.0452395 - ÚPT 2016 RIV CZ cze J - Journal Article
Krátký, Stanislav - Urbánek, Michal - Chlumská, Jana - Matějka, Milan - Meluzín, Petr - Kolařík, Vladimír - Horáček, Miroslav
Kombinace elektronové litografie s gaussovským svazkem a s proměnným tvarovaným svazkem.
[Combination of electron lithography with Gaussian and shaped beams.]
Jemná mechanika a optika. Roč. 60, č. 1 (2015), s. 10-13. ISSN 0447-6441
R&D Projects: GA MŠMT(CZ) LO1212
Institutional support: RVO:68081731
Keywords : e-beam writer * Gausssian beam * variable shaped beam
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0253409 - 4.0451587 - ÚPT 2016 RIV US eng J - Journal Article
Krátký, Stanislav - Urbánek, Michal - Kolařík, Vladimír
PEC Reliability in 3D E-beam DOE Nanopatterning.
Microscopy and Microanalysis. Roč. 21, S4 (2015), s. 230-235. ISSN 1431-9276. E-ISSN 1435-8115
R&D Projects: GA MŠMT(CZ) LO1212
Institutional support: RVO:68081731
Keywords : proximity effect correction * diffractive optical elements
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.730, year: 2015
Permanent Link: http://hdl.handle.net/11104/0252722 - 5.0433910 - ÚPT 2015 RIV CZ cze J - Journal Article
Urbánek, Michal - Krátký, Stanislav - Matějka, Milan - Kolařík, Vladimír - Horáček, Miroslav
Metody zápisu nanostruktur rastrovací sondou.
[Scanning Probe Nanolithography Methods.]
Chemické listy. Roč. 108, č. 10 (2014), s. 937-941. ISSN 0009-2770. E-ISSN 1213-7103
R&D Projects: GA MŠMT(CZ) LO1212
Keywords : scanning probe lithography * local anodic oxidation * nanoscratching * atomic force microscopy
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 0.272, year: 2014
Permanent Link: http://hdl.handle.net/11104/0238098 - 6.0429848 - ÚPT 2015 RIV CZ cze J - Journal Article
Urbánek, Michal - Krátký, Stanislav - Matějka, Milan - Kolařík, Vladimír - Horáček, Miroslav
Plazmochemické leptání křemíku v zařízení Diener nano.
[Plasmochemical Etching of Silicon in Diener Nano Device.]
Chemické listy. Roč. 108, č. 6 (2014), s. 592-595. ISSN 0009-2770. E-ISSN 1213-7103
R&D Projects: GA MŠMT(CZ) LO1212
Keywords : plasmochemical etching * silicon * etching rate * selectivity
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 0.272, year: 2014
Permanent Link: http://hdl.handle.net/11104/0234865 - 7.0385754 - ÚPT 2013 RIV CZ cze J - Journal Article
Horáček, Miroslav - Matějka, František - Kolařík, Vladimír - Matějka, Milan - Urbánek, Michal
Nano modifikace hrotu W(100)/ZrO elektronového emitéru reaktivním iontovým leptáním.
[Nano Modification of the W(100)/ZrO Electron Emitter Tip Using Reactive Ion Etching.]
Jemná mechanika a optika. Roč. 57, č. 10 (2012), s. 278-280. ISSN 0447-6441
R&D Projects: GA MŠMT ED0017/01/01; GA MPO FR-TI1/576
Institutional support: RVO:68081731
Keywords : electron emitter * reactive ion etching * electron emission * thermal field * W(100)/ZrO
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0215573 - 8.0370933 - ÚPT 2012 RIV CZ cze J - Journal Article
Kolařík, Vladimír - Matějka, František - Horáček, Miroslav - Matějka, Milan - Urbánek, Michal
Nanolitografie a kompenzace magnetického pole v prostředí s průmyslovým rušením.
[Nanolithography and Magnetic Field Cancellation in the Industrial Area.]
Jemná mechanika a optika. Roč. 56, 11-12 (2011), s. 312-316. ISSN 0447-6441
R&D Projects: GA MŠMT ED0017/01/01; GA MPO FR-TI1/576
Institutional research plan: CEZ:AV0Z20650511
Keywords : E-beam writer with a shaped beam * magnetic field cancelling system * electron optics column * nanolithography * nanotechnology
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0204605 - 9.0314356 - ÚPT 2009 RIV CZ cze J - Journal Article
Kolařík, Vladimír - Matějka, František - Lencová, Bohumila - Kokrhel, Svatopluk - Horáček, Miroslav - Radlička, Tomáš - Urbánek, Michal - Daněk, Lukáš
Zápis tvarovaným elektronovým svazkem.
[Writing System with Shaped Electron Beam.]
Jemná mechanika a optika. Roč. 53, č. 1 (2008), s. 11-16. ISSN 0447-6441
R&D Projects: GA ČR GA102/05/2325
Institutional research plan: CEZ:AV0Z20650511
Keywords : e-beam writing system * shaped electron beam * electron optics column * electron scattering * writing speed
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0164886