Search results
- 1.0464387 - ÚPT 2018 RIV CZ eng C - Conference Paper (international conference)
Matějka, Milan - Krátký, Stanislav - Řiháček, Tomáš - Kolařík, Vladimír - Chlumská, Jana - Urbánek, Michal
Nanopatterning of Silicon Nitride Membranes.
NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings. Ostrava: Tanger, 2017, s. 709-714. ISBN 978-80-87294-71-0.
[NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./. Brno (CZ), 19.10.2016-21.10.2016]
R&D Projects: GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : e-beam writer * silicon nitride membranes * nano patterning * anisotropic etching
OECD category: Nano-processes (applications on nano-scale)
Permanent Link: http://hdl.handle.net/11104/0270768 - 2.0464385 - ÚPT 2018 RIV CZ eng C - Conference Paper (international conference)
Horáček, Miroslav - Meluzín, Petr - Krátký, Stanislav - Urbánek, Michal - Bok, Jan - Kolařík, Vladimír
Phyllotactic Model Linking Nano and Macro World.
NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings. Ostrava: Tanger, 2017, s. 680-684. ISBN 978-80-87294-71-0.
[NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./. Brno (CZ), 19.10.2016-21.10.2016]
R&D Projects: GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : nano patterning * spiral grating structure * phyllotactic pattern * e-beam writer
OECD category: Nano-processes (applications on nano-scale)
Permanent Link: http://hdl.handle.net/11104/0270766 - 3.0449277 - ÚPT 2016 RIV CZ cze C - Conference Paper (international conference)
Krátký, Stanislav - Meluzín, Petr - Urbánek, Michal - Matějka, Milan - Chlumská, Jana - Horáček, Miroslav - Kolařík, Vladimír
Amplitudově fázová vortexová maska.
[An Amplitude-Phase Vortex Photo Mask.]
Sborník příspěvků multioborové konference LASER 55. Brno: Ústav přístrojové techniky AV ČR, 2015, s. 32-33. ISBN 978-80-87441-16-9.
[LASER 55. Třešť (CZ), 21.10.2015-23.10.2015]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : photo mask * vortex beam * e-beam lithography
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0251045 - 4.0437978 - ÚPT 2015 CZ eng C - Conference Paper (international conference)
Kolařík, Vladimír - Horáček, Miroslav - Urbánek, Michal - Matějka, Milan - Krátký, Stanislav - Chlumská, Jana - Bok, Jan
Structural Color of Metallic Surfaces.
METAL 2014. 23. ročník mezinárodní konference metalurgie a materiálů. Conference Proceedings. Ostrava: TANGER, 2014, s. 962-967. ISBN 978-80-87294-52-9.
[METAL 2014. Mezinárodní konference metalurgie a materiálů /23./. Brno (CZ), 21.05.2014-23.05.2014]
R&D Projects: GA MŠMT ED0017/01/01; GA MŠMT(CZ) LO1212; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : nano structures * structural color * metallic surface * e-beam lithography
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0241539 - 5.0437841 - ÚPT 2015 RIV CZ eng C - Conference Paper (international conference)
Krátký, Stanislav - Kolařík, Vladimír - Urbánek, Michal - Paták, Aleš - Horáček, Miroslav - Matějka, Milan
E-beam Nano-patterning for Electroforming Replication.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014. ISBN 978-80-87294-55-0.
[NANOCON 2014. International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : electron beam lithography * nano graphics * polymethyl methacrylate * metal sputtering * electroforming
Subject RIV: BH - Optics, Masers, Lasers
Permanent Link: http://hdl.handle.net/11104/0241328 - 6.0437840 - ÚPT 2015 RIV CZ eng C - Conference Paper (international conference)
Meluzín, Petr - Horáček, Miroslav - Urbánek, Michal - Bok, Jan - Krátký, Stanislav - Matějka, Milan - Chlumská, Jana - Kolařík, Vladimír
Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014. ISBN 978-80-87294-55-0.
[NANOCON 2014. International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : e-beam writer * optical nano structures * diffraction gratings * fractal gratings
Subject RIV: BH - Optics, Masers, Lasers
Permanent Link: http://hdl.handle.net/11104/0241326 - 7.0437838 - ÚPT 2015 RIV CZ eng C - Conference Paper (international conference)
Horáček, Miroslav - Krátký, Stanislav - Urbánek, Michal - Kolařík, Vladimír - Meluzín, Petr - Matějka, Milan - Chlumská, Jana
Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014. ISBN 978-80-87294-55-0.
[NANOCON 2014. International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01; GA TA ČR TE01020118
Institutional support: RVO:68081731
Keywords : e-beam writer * Gaussian beam * variable shaped beam
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0241322 - 8.0437827 - ÚPT 2015 RIV CZ eng C - Conference Paper (international conference)
Urbánek, Michal - Krátký, Stanislav - Šimík, M. - Kolařík, Vladimír - Horáček, Miroslav - Matějka, Milan
Plasmonic Structures In PMMA Resist.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014. ISBN 978-80-87294-55-0.
[NANOCON 2014. International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
R&D Projects: GA MŠMT ED0017/01/01; GA MŠMT(CZ) LO1212; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : electron beam lithography * plasmonic structures * PMMA * metal coating
Subject RIV: BA - General Mathematics
Permanent Link: http://hdl.handle.net/11104/0241317 - 9.0434553 - ÚPT 2015 RIV CZ cze C - Conference Paper (international conference)
Krátký, Stanislav - Urbánek, Michal - Kolařík, Vladimír - Horáček, Miroslav - Chlumská, Jana - Matějka, Milan - Šerý, Mojmír - Mikel, Břetislav
Fázové masky vyrobené elektronovou litografií a iontovým leptáním pro přípravu vláken s braggovými mřížkami.
[Phase photo masks produced by means of electron beam lithography and ion etching for Bragg gratings.]
Sborník příspěvků multioborové konference Laser54. Brno: Ústav přístrojové techniky AV ČR, 2014, s. 31-32. ISBN 978-80-87441-13-8.
[Laser54. Třešť (CZ), 29.10.2014-31.10.2014]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01; GA TA ČR TE01020233; GA TA ČR TE01020118
Institutional support: RVO:68081731
Keywords : electron beam lithography * industrial holography
Subject RIV: BH - Optics, Masers, Lasers
Permanent Link: http://hdl.handle.net/11104/0238707 - 10.0434105 - ÚPT 2015 RIV CZ eng C - Conference Paper (international conference)
Horáček, Miroslav - Bok, Jan - Kolařík, Vladimír - Urbánek, Michal - Matějka, Milan - Krátký, Stanislav
Measurement of current density distribution in shaped e-beam writers.
18th International Microscopy Congres. Proceedings. Praha: Czechoslovak Microscopy Society, 2014. ISBN 978-80-260-6720-7.
[International Microscopy Congres /18./. Praha (CZ), 07.09.2014-12.09.2014]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01; GA TA ČR TE01020118
Institutional support: RVO:68081731
Keywords : e-beam writer * current density
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0238240