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- 1.0333108 - ÚFP 2011 CH eng P - Patent Document
Babický, Václav - Člupek, Martin - Lukeš, Petr - Šunka, Pavel
Apparatus for decontamination and disinfection of aqueous solutions.
Geneva: World Intellectual Property Organization (WIPO), 2009. Owner: Ústav fyziky plazmatu AV ČR , v. v. i. Date of the patent registration: 11.09.2008. Date of the patent acceptance: 19.03.2009. Patent Number: PCT/CZ2008/000103
R&D Projects: GA AV ČR IAAX00430802
Institutional research plan: CEZ:AV0Z20430508
Keywords : non-thermal plasma * electrical discharge * water treatment * disinfection
Subject RIV: BL - Plasma and Gas Discharge Physics
http://www.wipo.int/pctdb/en/fetch.jsp?LANG=ENG&DBSELECT=PCT&SERVER_TYPE=19-10&SORT=41333753-KEY&TYPE_FIELD=256&IDB=0&IDOC=1773750&C=10&ELEMENT_SET=B&RESULT=1&TOTAL=1&START=1&DISP=25&FORM=SEP-0/HITNUM,B-ENG,DP,MC,AN,PA,ABSUM-ENG&SEARCH_IA=CZ2008000103&QUERY=%28PCT%2fCZ2008%2f000103%29+
Permanent Link: http://hdl.handle.net/11104/0196819 - 2.0333103 - ÚFP 2010 RIV CZ cze P - Patent Document
Babický, Václav - Člupek, Martin - Lukeš, Petr - Šunka, Pavel
Zařízení pro dekontaminaci a dezinfekci vodných roztoků.
[Apparatus for decontamination and disinfection of aqueous solutions.]
Praha: Úřad průmyslového vlastnictví ČR, 2009. Owner: Ústav fyziky plazmatu AV ČR, v.v.i. Date of the patent registration: 12.09.2007. Date of the patent acceptance: 21.09.2009. 4. Patent Number: CZ 301 074 B6
R&D Projects: GA AV ČR IAAX00430802
Institutional research plan: CEZ:AV0Z20430508
Keywords : non-thermal plasma * electrical discharge * water treatment * disinfection
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0178173 - 3.0179155 - UFP-V 20030034 CZ cze P - Patent Document
Šunka, Pavel - Babický, Václav - Člupek, Martin - Neufuss, Karel - Beneš, Jiří
Způsob generace fokusované rázové vlny elektrickým výbojem v kapalině a zařízení k provádění tohoto způsobu.
[A new method for generation of focused shock wave by electrical discharge in liquid and a device for realization of this method.]
Praha 8, Za Slovankou 3: Ustav fyziky plazmatu AV ČR, 2002. 20000425. Date of the patent acceptance: 20021030. 8 s. Patent Number: 291 158
R&D Projects: GA AV ČR IBS2043004
Institutional research plan: CEZ:AV0Z2043910
Keywords : focused shock wave, pulsed electrical discharge in liquids, multi-channel discharge, parabolic reflector anode with porous ceramic layer
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0075963