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0023440 - FZÚ 2006 CH eng J - Journal Article
Baroch, P. - Musil, Jindřich - Vlček, J. - Nam, K. H. - Han, J. G.
Reactive magnetron sputtering of TiO_x films.
Surface and Coatings Technology. Roč. 193, - (2005), s. 107-111. ISSN 0257-8972
Institutional research plan: CEZ:AV0Z10100520
Keywords : TiO_x films * reactive sputtering * dual magnetron * hysteresis effect * deposition rate * phase composition
Impact factor: 1.646, year: 2005
Permanent Link: http://hdl.handle.net/11104/0112082