Search results
- 1.0571799 - ÚFP 2024 RIV CH eng J - Journal Article
Akhmetov, F. - Medvedev, Nikita - Makhotkin, I. - Ackermann, M. - Milov, I.
Effect of Atomic-Temperature Dependence of the Electron–Phonon Coupling in Two-Temperature Model.
Materials. Roč. 15, č. 15 (2022), č. článku 5193. E-ISSN 1996-1944
R&D Projects: GA MŠMT(CZ) LM2018114; GA MŠMT LTT17015; GA MŠMT EF16_013/0001552
Institutional support: RVO:61389021
Keywords : electron–phonon coupling * two-temperature model
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.4, year: 2022
Method of publishing: Open access
https://www.mdpi.com/1996-1944/15/15/5193
Permanent Link: https://hdl.handle.net/11104/0342701 - 2.0560473 - FZÚ 2023 RIV CH eng J - Journal Article
Akhmetov, F. - Medvedev, Nikita - Makhotkin, I. - Ackermann, M. - Milov, I.
Effect of atomic‐temperature dependence of the electron–phonon coupling in two‐temperature model.
Materials. Roč. 15, č. 15 (2022), č. článku 5193. E-ISSN 1996-1944
R&D Projects: GA MŠMT LTT17015; GA MŠMT(CZ) LM2018114
EU Projects: European Commission(XE) 654148 - LASERLAB-EUROPE
Research Infrastructure: e-INFRA CZ - 90140
Institutional support: RVO:68378271
Keywords : electron–phonon coupling * two‐temperature model * ultrafast laser irradiation of metals
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.4, year: 2022
Method of publishing: Open access
Permanent Link: https://hdl.handle.net/11104/0333397File Download Size Commentary Version Access 0560473.pdf 1 3.3 MB CC Licence Publisher’s postprint open-access - 3.0487414 - FZÚ 2019 RIV GB eng J - Journal Article
Makhotkin, I. - Sobierajski, R. - Chalupský, Jaromír - Tiedtke, K. - de Vries, G. - Stoermer, M. - Scholze, F. - Siewert, F. - van de Kruijs, R.W.E. - Milov, I. - Louis, E. - Jacyna, I. - Jurek, M. - Klinger, D. - Nittler, L. - Syryanyy, Y. - Juha, Libor - Hájková, Věra - Vozda, Vojtěch - Burian, Tomáš - Saksl, Karel - Faatz, B. - Keitel, B. - Ploenjes, E. - Schreiber, S. - Toleikis, S. - Loch, R.A. - Hermann, M. - Strobel, S. - Nienhuys, H.-K. - Gwalt, G. - Mey, T. - Enkisch, H.
Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
Journal of Synchrotron Radiation. Roč. 25, č. 1 (2018), s. 77-84. ISSN 0909-0495. E-ISSN 1600-5775.
[Workshop on FEL Photon Diagnostics, Instrumentation and Beamline Design (PhotonDiag2017). Stanford, 01.05.2017-03.05.2017]
R&D Projects: GA MŠMT LG15013; GA ČR(CZ) GA17-05167s; GA ČR(CZ) GA14-29772S
Institutional support: RVO:68378271
Keywords : free-electron laser induced damage * EUV optics * thin films * FELs
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.452, year: 2018
Permanent Link: http://hdl.handle.net/11104/0283325 - 4.0486531 - ÚFP 2018 RIV US eng J - Journal Article
Sobierajski, R. - Jacyna, I. - Dlužewski, P. - Klepka, M.T. - Klinger, D. - Pełka, J.B. - Burian, T. - Hájková, V. - Juha, Libor - Saksl, K. - Vozda, V. - Makhotkin, I. - Louis, E. - Faatz, B. - Tiedtke, K. - Toleikis, S. - Enkisch, H. - Hermann, M. - Strobel, S. - Loch, R.A. - Chalupský, J.
Role of heat accumulation in the multi-shot damage of silicon irradiated with femtosecond XUV pulses at a 1 MHz repetition rate.
Optics Express. Roč. 24, č. 14 (2016), s. 15468-15477. ISSN 1094-4087
Institutional support: RVO:61389021
Keywords : free-electron lasers * damage * x-rays * soft x-rays * extreme ultraviolet (EUV) * semiconductor materials * materials processing
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.307, year: 2016
https://doi.org/10.1364/OE.24.015468
Permanent Link: http://hdl.handle.net/11104/0281362 - 5.0466618 - FZÚ 2017 RIV US eng J - Journal Article
Sobierajski, R. - Jacyna, I. - Dlužewski, P. - Klepka, M.T. - Klinger, D. - Pelka, J. B. - Burian, Tomáš - Hájková, Věra - Juha, Libor - Saksl, K. - Vozda, Vojtěch - Makhotkin, I. - Louis, E. - Faatz, B. - Tiedtke, K. - Toleikis, S. - Enkisch, H. - Hermann, M. - Strobel, S. - Loch, R.A. - Chalupský, Jaromír
Role of heat accumulation in the multi-shot damage of silicon irradiated with femtosecond XUV pulses at a 1 MHz repetition rate.
Optics Express. Roč. 24, č. 14 (2016), s. 15468-15477. ISSN 1094-4087
R&D Projects: GA MŠMT(CZ) LH14072; GA ČR(CZ) GA14-29772S
Institutional support: RVO:68378271
Keywords : free-electron lasers * damage * x-rays * soft x-rays * extreme ultraviolet (EUV) * semiconductor materials * materials processing
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 3.307, year: 2016
Permanent Link: http://hdl.handle.net/11104/0264888