Search results
- 1.0573847 - FZÚ 2024 RIV GB eng J - Journal Article
Kapran, Anna - Hippler, Rainer - Wulff, H. - Olejníček, Jiří - Písaříková, Aneta - Čada, Martin - Hubička, Zdeněk
Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films.
Vacuum. Roč. 215, Sept. (2023), č. článku 112272. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : hollow cathode discharg * plasma diagnostics * mixed CuNiO thin film * film diagnostics * photoelectrochemical activity
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2023.112272
Permanent Link: https://hdl.handle.net/11104/0344198 - 2.0566773 - FZÚ 2023 RIV US eng J - Journal Article
Hrubantová, Aneta - Hippler, Rainer - Wulff, H. - Čada, Martin - Gedeon, O. - Jiříček, Petr - Houdková, Jana - Olejníček, Jiří - Nepomniashchaia, Natalia - Helm, C.A. - Hubička, Zdeněk
Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering.
Journal of Applied Physics. Roč. 132, č. 21 (2022), č. článku 215301. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Research Infrastructure: CzechNanoLab - 90110
Institutional support: RVO:68378271
Keywords : HiPIMS * sputtering * photoelectrochemical activity * FTO glass * film properties
OECD category: Coating and films
Impact factor: 3.2, year: 2022
Method of publishing: Open access
Permanent Link: https://hdl.handle.net/11104/0338068File Download Size Commentary Version Access 0566773.pdf 0 3.5 MB CC licence Publisher’s postprint open-access - 3.0562485 - FZÚ 2023 RIV US eng J - Journal Article
Hrubantová, Aneta - Hippler, Rainer - Wulff, H. - Čada, Martin - Olejníček, Jiří - Nepomniashchaia, Natalia - Helm, C.A. - Hubička, Zdeněk
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 40, č. 6 (2022), č. článku 063402. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : reactive sputtering * plasma * thin films * semiconductor * XRD
OECD category: Coating and films
Impact factor: 2.9, year: 2022
Method of publishing: Limited access
https://doi.org/10.1116/6.0002012
Permanent Link: https://hdl.handle.net/11104/0335052 - 4.0555890 - FZÚ 2023 RIV GB eng J - Journal Article
Olejníček, Jiří - Hrubantová, Aneta - Volfová, Lenka - Dvořáková, Michaela - Kohout, Michal - Tvarog, Drahoslav - Gedeon, O. - Wulff, H. - Hippler, Rainer - Hubička, Zdeněk
WO3 and WO3-x thin films prepared by DC hollow cathode discharge.
Vacuum. Roč. 195, Jan (2022), č. článku 110679. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S; GA MPO FV20580
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : tungsten oxide * WO3 * hollow cathode discharge * sputtering * thin films
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2021.110679
Permanent Link: http://hdl.handle.net/11104/0330352 - 5.0552199 - FZÚ 2022 RIV CH eng J - Journal Article
Sezemsky, P. - Burnat, D. - Kratochvíl, J. - Wulff, H. - Kruth, A. - Lechowicz, K. - Janik, M. - Bogdanowicz, R. - Čada, Martin - Hubička, Zdeněk - Niedzialkowski, P. - Bialobrzeska, W. - Straňák, V. - Smietana, M.
Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems.
Sensors and Actuators B - Chemical. Roč. 343, Sep (2021), č. článku 130173. E-ISSN 0925-4005
Institutional support: RVO:68378271
Keywords : Indium tin oxide * sensor * optical sensing * HiPIMS * sputtering
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 9.221, year: 2021
Method of publishing: Open access
Permanent Link: http://hdl.handle.net/11104/0327330File Download Size Commentary Version Access 0552199.pdf 2 4.4 MB CC Licence Publisher’s postprint open-access - 6.0552187 - FZÚ 2022 RIV CH eng J - Journal Article
Mukhopadhyay, A.K. - Roy, A. - Bhattacharjee, G. - Das, S.C. - Majumdar, A. - Wulff, H. - Hippler, Rainer
Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering.
Materials. Roč. 14, č. 12 (2021), č. článku 3191. E-ISSN 1996-1944
Institutional support: RVO:68378271
Keywords : magnetron sputtering * Ti-Cu-N coating * N incorporation * X-ray photoelectron spectroscopy * X-ray diffraction * transmission electron microscopy
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.748, year: 2021
Method of publishing: Open access
Permanent Link: http://hdl.handle.net/11104/0327392File Download Size Commentary Version Access 0552187.pdf 2 5.6 MB CC Licence Publisher’s postprint open-access - 7.0541687 - FZÚ 2022 RIV CH eng J - Journal Article
Hippler, Rainer - Čada, Martin - Kšírová, Petra - Olejníček, Jiří - Jiříček, Petr - Houdková, Jana - Wulff, H. - Kruth, A. - Helm, C.A. - Hubička, Zdeněk
Deposition of cobalt oxide films by reactive pulsed magnetron sputtering.
Surface and Coatings Technology. Roč. 405, Jan (2021), č. článku 126590. ISSN 0257-8972
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA19-00579S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR(CZ) StrategieAV21/6
Program: StrategieAV
Institutional support: RVO:68378271
Keywords : cobalt oxide film * pulsed magnetron sputtering * HiPIMS * Raman spectroscopy * XPS * XRD * electrical resistivity
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4.865, year: 2021
Method of publishing: Limited access
https://doi.org/10.1016/j.surfcoat.2020.126590
Permanent Link: http://hdl.handle.net/11104/0319218 - 8.0510812 - FZÚ 2020 RIV CH eng J - Journal Article
Straňák, V. - Drache, S. - Wulff, H. - Hubička, Zdeněk - Tichý, M. - Kruth, A. - Helm, Ch.A. - Hippler, R.
Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix.
Thin Solid Films. Roč. 589, Aug (2015), s. 864-871. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA ČR GAP108/12/2104
Institutional support: RVO:68378271
Keywords : copper * nanocomposite * nanoparticles * oxidation * sputtering * titanium dioxide matrix
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 1.761, year: 2015
Method of publishing: Limited access
https://doi.org/10.1016/j.tsf.2015.07.026
Permanent Link: http://hdl.handle.net/11104/0301188 - 9.0489691 - FZÚ 2019 RIV GB eng J - Journal Article
Straňák, V. - Hubička, Zdeněk - Čada, Martin - Bogdanowicz, R. - Wulff, H. - Helm, C.A. - Hippler, R.
Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering.
Journal of Physics D-Applied Physics. Roč. 51, č. 9 (2018), s. 1-12, č. článku 095205. ISSN 0022-3727. E-ISSN 1361-6463
R&D Projects: GA ČR GA17-08389S
Institutional support: RVO:68378271
Keywords : high power impulse magnetron sputtering (HiPIMS) * iron oxide thin films * wüstite * magnetite * maghemite * hematite
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.829, year: 2018
Permanent Link: http://hdl.handle.net/11104/0284063 - 10.0489659 - FZÚ 2019 RIV CH eng J - Journal Article
Straňák, V. - Bogdanowicz, R. - Sezemsky, P. - Wulff, H. - Kruth, A. - Smietana, M. - Kratochvíl, J. - Čada, Martin - Hubička, Zdeněk
Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges.
Surface and Coatings Technology. Roč. 335, Feb (2018), s. 126-133. ISSN 0257-8972
Institutional support: RVO:68378271
Keywords : film properties * HiPIMS * ITO * plasma deposition
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.192, year: 2018
Permanent Link: http://hdl.handle.net/11104/0284031