Search results
- 1.0487382 - ÚFCH JH 2018 RIV CZ eng C - Conference Paper (international conference)
Blejchař, T. - Nevrlý, V. - Vašinek, M. - Dostál, Michal - Pečínka, L. - Dlabka, J. - Stachoň, M. - Juha, Libor - Bitala, P. - Zelinger, Zdeněk - Pira, P. - Wild, J.
Material properties of lithium fluoride for predicting XUV laser ablation rate and threshold fluence.
Proceedings of SPIE. In: DAMAGE TO VUV, EUV, AND X-RAY OPTICS V. Proceedings of SPIE. Prague: SPIE, 2015, č. článku 95110K. ISBN 978-1-62841-632-9.
[Conference on Damage to VUV, EUV, and X-Ray Optics V. Prague (CZ), 15.04.2015-16.04.2015]
R&D Projects: GA ČR(CZ) GAP108/11/1312
Institutional support: RVO:61388955 ; RVO:68378271
Keywords : ablation curve * threshold fluence * lithium fluoride * thermomechanic model * quasi-random sampling
OECD category: Physical chemistry; Fluids and plasma physics (including surface physics) (FZU-D)
Permanent Link: http://hdl.handle.net/11104/0282044File Download Size Commentary Version Access 0487382.pdf 1 867.8 KB Publisher’s postprint require - 2.0424964 - FZÚ 2014 RIV US eng C - Conference Paper (international conference)
Nevrlý, V. - Janků, J. - Dlabka, J. - Vašinek, M. - Juha, Libor - Vyšín, Luděk - Burian, Tomáš - Lančok, Ján - Skříňský, J. - Zelinger, Zdeněk - Pira, P. - Wild, J.
Global sensitivity analysis of the XUV-ABLATOR code.
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III. Bellingham: SPIE, 2013 - (Juha, L.; Bajt, S.; London, R.; Hudec, R.; Pína, L.). Proceedings of SPIE, 8777. ISBN 9780819495792.
[Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III. Praha (CZ), 15.04.2013-18.04.2013]
R&D Projects: GA ČR(CZ) GAP108/11/1312
Institutional support: RVO:68378271 ; RVO:61388955
Keywords : extreme ultraviolet laser * ablation * model * sensitivity analysis * high dimensional model representation
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0230940 - 3.0372407 - FZÚ 2012 RIV US eng C - Conference Paper (international conference)
Pira, P. - Burian, Tomáš - Vyšín, Luděk - Chalupský, Jaromír - Lančok, Ján - Wild, J. - Střižík, M. - Zelinger, Zdeněk - Rocca, J.J. - Juha, Libor
Ablation of ionic crystals induced by capillary-discharge XUV laser.
Damage to VUV, EUV, and X-ray Optics III. Bellingham: SPIE, 2011 - (Juha, L.; Bajt, S.; London, R.), 807719/1-807719/7. Proceedings of SPIE, 8077. ISBN 9780819486677. ISSN 0277-786X.
[Conference on Damage to VUV, EUV, and X-ray Optics III. Prague (CZ), 18.04.2011-20.04.2011]
R&D Projects: GA AV ČR KAN300100702; GA MŠMT LC510; GA MŠMT(CZ) LC528; GA MŠMT LA08024; GA AV ČR IAAX00100903; GA ČR GAP208/10/2302; GA MŠMT(CZ) ME10046
Institutional research plan: CEZ:AV0Z10100523; CEZ:AV0Z40400503
Keywords : extreme ultraviolet laser, * XUV laser * capillary-discharge laser * ionic crystals * XUV ablation * XUV desorption * pulsed laser deposition * PLD
Subject RIV: BH - Optics, Masers, Lasers
http://dx.doi.org/ 10.1117/12.890406
Permanent Link: http://hdl.handle.net/11104/0205734 - 4.0335795 - FZÚ 2010 RIV US eng C - Conference Paper (international conference)
Vyšín, Luděk - Burian, T. - Chalupský, Jaromír - Grisham, M. - Hájková, Věra - Heinbuch, S. - Jakubczak, Krzysztof - Martz, D. - Mocek, Tomáš - Pira, P. - Polan, Jiří - Rocca, J.J. - Rus, Bedřich - Sobota, Jaroslav - Juha, Libor
Characterization of the focused beam from a 10-Hz desktop capillary-discharge 46.9-nm laser.
[Charakterizace fokusovaného 46,9 nm svazku 10 Hz stolního kapilárního laseru.]
Damage to VUV, EUV, and X-ray Optics II. Bellingham: SPIE, 2009 - (Juha, L.; Bajt, S.; Sobierajski, R.), 73610O/1-73610O/8. Proceedings of SPIE, 7361. ISBN 9780819476357. ISSN 0277-786x.
[Damage to VUV, EUV, and X-Ray Optics II. Prague (CZ), 21.04.2009-23.04.2009]
R&D Projects: GA AV ČR KAN300100702; GA MŠMT LC510; GA MŠMT(CZ) LC528; GA MŠMT LA08024; GA AV ČR IAAX00100903; GA ČR GA203/06/1278; GA AV ČR IAA400100701
Institutional research plan: CEZ:AV0Z10100523; CEZ:AV0Z20650511
Keywords : XUV laser * capillary-discharge laser * annular intensity distribution * beam imprint * photo-induced erosion
Subject RIV: BH - Optics, Masers, Lasers
http://dx.doi.org/10.1117/12.822759
Permanent Link: http://hdl.handle.net/11104/0180164