Search results
- 1.0549949 - FZÚ 2022 RIV FR eng A - Abstract
Remeš, Zdeněk - Artemenko, Anna - Ukraintsev, Egor - Rezek, B. - Poruba, A. - Hsu, H.S. - Mičová, J.
The changes induced on oriented ZnO surface by inductively coupled plasma (ICP).
E-MRS Spring Meeting - Symposia & program Section N Current trends in optical and X-ray metrology of advanced materials for nanoscale devices VI. Strasbourg: European Materials Research Society (E-MRS), 2021.
[2021 Spring Meeting of the European Materials Research Society (E-MRS). 31.05.2021-03.06.2021, Virtual]
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR GC19-02858J; GA MŠMT LM2018110
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR(CZ) SAV-21-09; AV ČR(CZ) StrategieAV21/6
Program: Bilaterální spolupráce; StrategieAV
Institutional support: RVO:68378271
Keywords : ICP * ZnO * XPS * AFM
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Permanent Link: http://hdl.handle.net/11104/0325863 - 2.0539247 - FZÚ 2021 RIV CZ eng A - Abstract
Chang, Yu-Ying - Remeš, Zdeněk - Szabó, Ondrej - Poruba, A. - Mičová, J.
The plasma hydrogenation of nanostructured ZnO powder.
Proceedings of Abstracts - Nanocon 2019. Ostrava: Tanger Ltd., 2019 - (Shrbená-Váňová, J.). s. 96-97. ISBN 978-80-87294-94-9.
[Nanocon 2019 International Conference on Nanomaterials - Research & Application /11./. 16.10.2019-18.10.2019, Brno]
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR GC19-02858J; GA TA ČR(CZ) TG02010056
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : ZnO * hydrogen plasma treatment
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Permanent Link: http://hdl.handle.net/11104/0316919 - 3.0316651 - ÚPT 2009 CZ cze A - Abstract
Hégr, O. - Boušek, J. - Fořt, Tomáš - Sobota, Jaroslav - Varuňková, V. - Bařinka, R. - Poruba, A.
Naprašované vrstvy SiNx:H s leptáním mono-Si povrchu v plazmatickém H2.
[Sputtered coatings of SiNx:H on H2 plasma etched mono-Si substrate.]
Sborník abstraktů - 3. Česká fotovoltaická konference. Brno: Czech RE Agency, 2008. s. 53. ISBN N.
[Česká fotovoltaická konference /3./. 03.11.2008-05.11.2008, Brno]
Institutional research plan: CEZ:AV0Z20650511
Keywords : magnetron sputtering * passivation layer * SiNx:H * MW-PCD * FTIR
Subject RIV: BL - Plasma and Gas Discharge Physics
Permanent Link: http://hdl.handle.net/11104/0166507