0481625 - ASÚ 2018 US eng C - Conference Paper (international conference)
Míka, M. - Jankovský, O. - Šimek, P. - Lutyakov, O. - Havlíková, R. - Šofer, Z. - Hudec, René - Pína, L. - Inneman, A. - Švéda, L. - Maršíková, V.Slumping of Si wafers at high temperature.
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III. Bellingham: SPIE, 2013 - (Juha, L.; Bajt, S.; London, R.; Hudec, R.; Pína, L.). Proceedings of SPIE, 8777. ISBN 9780819495792.
[Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III. Praha (CZ), 15.04.2013-18.04.2013]
Institutional support: RVO:67985815
Keywords : silicon * x-ray telescope * thermal forming
OECD category: Electrical and electronic engineering
Permanent Link: http://hdl.handle.net/11104/0277159
