Search results
- 1.0579072 - ÚPT 2024 RIV CZ cze V - Research Report
Matějka, Milan - Krátký, Stanislav - Meluzín, Petr - Košelová, Zuzana - Chlumská, Jana - Horáček, Miroslav - Kolařík, Vladimír - Knápek, Alexandr
SMV-2023-06: Vývoj testovacích preparátů pro REM.
[SMV-2023-06: Development of test specimens for SEM.]
Brno: TESCAN Brno a.s., 2023. 4 s.
Source of funding: N - Non-public resources
Keywords : relief structure * e-beam lithography * silicon etching * microlithography
OECD category: Optics (including laser optics and quantum optics)
Permanent Link: https://hdl.handle.net/11104/0347946 - 2.0579070 - ÚPT 2024 RIV CZ cze V - Research Report
Matějka, Milan - Krátký, Stanislav - Meluzín, Petr - Košelová, Zuzana - Chlumská, Jana - Horáček, Miroslav - Kolařík, Vladimír - Knápek, Alexandr
SMV-2023-05: DI2023.
[SMV-2023-05: DI2023.]
Brno: DELONG INSTRUMENTS a.s., 2023. 4 s.
Source of funding: N - Non-public resources
Keywords : relief structure * e-beam lithography * silicon etching * microlithography
OECD category: Optics (including laser optics and quantum optics)
Permanent Link: https://hdl.handle.net/11104/0347943 - 3.0566446 - ÚPT 2023 RIV CZ cze V - Research Report
Matějka, Milan - Horáček, Miroslav - Meluzín, Petr - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír - Krátký, Stanislav
SMV-2022-57: Vývoj testovacích preparátů pro REM.
[SMV-2022-57: Development of test specimens for SEM.]
Brno: TESCAN Brno s.r.o., 2022. 5 s.
Source of funding: N - Non-public resources
Keywords : relief structure * e-beam lithography * silicon etching * microlithography
OECD category: Optics (including laser optics and quantum optics)
Permanent Link: https://hdl.handle.net/11104/0337763 - 4.0545142 - ÚPT 2022 RIV CZ cze V - Research Report
Matějka, Milan - Horáček, Miroslav - Chlumská, Jana - Kolařík, Vladimír - Krátký, Stanislav
SMV-2021-03: Vývoj testovacích preparátů pro REM.
[SMV-2021-03: Development of test specimens for SEM.]
Brno: Tescan Brno, s.r.o., 2021. 6 s.
Source of funding: N - Non-public resources
Keywords : relief structure * e-beam lithography * silicon etching * microlithography
OECD category: Optics (including laser optics and quantum optics)
Permanent Link: http://hdl.handle.net/11104/0321890 - 5.0536616 - ÚPT 2021 RIV CZ cze V - Research Report
Matějka, Milan - Horáček, Miroslav - Meluzín, Petr - Chlumská, Jana - Kolařík, Vladimír - Krátký, Stanislav - Pokorná, Zuzana
SMV-2020-23: Vývoj testovacích preparátů pro REM.
[SMV-2020-23: Development of test specimens for SEM.]
Brno: Tescan Brno s.r.o., 2020. 8 s.
Source of funding: N - Non-public resources
Keywords : relief structure: e-beam lithography * silicon etching * microlithography
OECD category: Nano-processes (applications on nano-scale)
Permanent Link: http://hdl.handle.net/11104/0314396 - 6.0536030 - ÚPT 2021 CZ cze V - Research Report
Matějka, Milan - Horáček, Miroslav - Meluzín, Petr - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír - Krátký, Stanislav - Knápek, Alexandr
SMV-2020-24: Vývoj testovacích preparátů pro REM.
[SMV-2020-24: Development of test specimens for SEM.]
Brno: Delong Instruments, a.s., 2020. 7 s.
Source of funding: N - Non-public resources
Keywords : relief structure: e-beam lithography * relief structure: silicon etching * silicon etching * microlithography
Subject RIV: BH - Optics, Masers, Lasers
Permanent Link: http://hdl.handle.net/11104/0313879 - 7.0525191 - ÚPT 2021 RIV SK eng J - Journal Article
Matějka, Milan - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
Functional nano-structuring of thin silicon nitride membranes.
Journal of Electrical Engineering - Elektrotechnický časopis. Roč. 71, č. 2 (2020), s. 127-130. ISSN 1335-3632. E-ISSN 1339-309X
R&D Projects: GA TA ČR(CZ) TN01000008; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : membrane * nano optical device * electron optics * electron beam lithography * silicon nitride * reactive ion etching * silicon etching * microfabrication
OECD category: Nano-processes (applications on nano-scale)
Impact factor: 0.647, year: 2020
Method of publishing: Open access
https://content.sciendo.com/view/journals/jee/71/2/article-p127.xml
Permanent Link: http://hdl.handle.net/11104/0309382 - 8.0518131 - ÚPT 2020 RIV CZ cze V - Research Report
Matějka, Milan - Horáček, Miroslav - Meluzín, Petr - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír - Krátký, Stanislav - Knápek, Alexandr
SMV-2019-06: Vývoj testovacích preparátů pro REM.
[SMV-2019-06: Development of test specimens for SEM.]
Brno: TESCAN Brno s.r.o., 2019. 4 s.
Source of funding: N - Non-public resources
Keywords : calibration specimen * relief structure * e-beam lithography * silicon etching * microlithography
OECD category: Nano-processes (applications on nano-scale)
Permanent Link: http://hdl.handle.net/11104/0303306 - 9.0498864 - ÚPT 2019 RIV CZ cze V - Research Report
Matějka, Milan - Horáček, Miroslav - Meluzín, Petr - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír - Krátký, Stanislav - Knápek, Alexandr
SMV-2018-05: Vývoj testovacích preparátů pro REM.
[SMV-2018-05: Development of test specimens for SEM.]
Brno: TESCAN Brno, 2018. 5 s.
Source of funding: N - Non-public resources
Keywords : relief structure * e-beam lithography * silicon etching * microlithography
OECD category: Nano-processes (applications on nano-scale)
Permanent Link: http://hdl.handle.net/11104/0291155 - 10.0484819 - FZÚ 2018 RIV CZ eng C - Conference Paper (international conference)
Křížek, Filip - Pikna, Peter - Fejfar, Antonín
Silver catalysed nanoscale silicon etching in water vapour.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014, s. 21-24. ISBN 978-80-87294-55-0.
[NANOCON International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
R&D Projects: GA ČR GA13-25747S; GA ČR GA13-12386S; GA MŠMT(CZ) LM2011026
Institutional support: RVO:68378271
Keywords : silicon etching * water vapour * silver nanoparticles * thermal annealing
OECD category: Nano-materials (production and properties)
Permanent Link: http://hdl.handle.net/11104/0279955