Search results
- 1.0451587 - ÚPT 2016 RIV US eng J - Journal Article
Krátký, Stanislav - Urbánek, Michal - Kolařík, Vladimír
PEC Reliability in 3D E-beam DOE Nanopatterning.
Microscopy and Microanalysis. Roč. 21, S4 (2015), s. 230-235. ISSN 1431-9276. E-ISSN 1435-8115
R&D Projects: GA MŠMT(CZ) LO1212
Institutional support: RVO:68081731
Keywords : proximity effect correction * diffractive optical elements
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.730, year: 2015
Permanent Link: http://hdl.handle.net/11104/0252722 - 2.0431332 - ÚPT 2015 CZ eng A - Abstract
Kolařík, Vladimír - Krátký, Stanislav - Urbánek, Michal
PEC reliability in 3D e-beam DOE nanopatterning.
9th International Conference on Charged Particle Optics. Book of Abstracts. Brno: Institute of Scientific Instruments AS CR, v. v. i, 2014. s. 37. ISBN 978-80-87441-11-4.
[International Conference on Charged Parrticle Optics /9./. 31.08.2014-05.09.2014, Brno]
R&D Projects: GA MŠMT(CZ) LO1212; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : proximity effect correction * diffractive optical elements
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0236392 - 3.0390977 - ÚPT 2013 RIV CZ eng C - Conference Paper (international conference)
Urbánek, Michal - Kolařík, Vladimír - Matějka, Milan - Matějka, František - Bok, Jan - Mikšík, P. - Vašina, J.
Shaped E-beam nanopatterning with proximity effect correction.
NANOCON 2012, 4th International Conference Proceedings. Ostrava: TANGER Ltd, 2012, s. 717-722. ISBN 978-80-87294-32-1.
[NANOCON 2012. International Conference /4./. Brno (CZ), 23.10.2012-25.10.2012]
R&D Projects: GA MPO FR-TI1/576; GA MŠMT ED0017/01/01; GA TA ČR TE01020233
Institutional support: RVO:68081731
Keywords : e-beam writer * shaped beam * proximity effect correction
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Permanent Link: http://hdl.handle.net/11104/0219844