Search results
- 1.0585696 - ÚFCH JH 2025 RIV NL eng J - Journal Article
Krýsová, Hana - Cichoň, S. - Kapran, A. - Volfová, L. - Chvostová, D. - Imrich, T. - Neumann-Spallart, M. - Krýsa, J. - Hubička, Z.
Deposition of Fe2O3:Sn semiconducting thin films by reactive pulsed HiPIMS + ECWR co-sputtering from Fe and Sn targets.
Journal of Photochemistry and Photobiology A-Chemistry. Roč. 454, SEP 2024 (2024), č. článku 115676. ISSN 1010-6030. E-ISSN 1873-2666
R&D Projects: GA ČR(CZ) GA23-05266S; GA MŠMT(CZ) LM2023066; GA MŠMT(CZ) EF16_013/0001821
Research Infrastructure: CzechNanoLab - 90110
Institutional support: RVO:61388955
Keywords : HiPIMS * ECWR * Co-sputtering
OECD category: Physical chemistry
Impact factor: 4.3, year: 2022
Method of publishing: Limited access
https://www.sciencedirect.com/science/article/pii/S101060302400220X?via%3Dihub
Permanent Link: https://hdl.handle.net/11104/0353396File Download Size Commentary Version Access 0585696.pdf 0 2.7 MB Publisher’s postprint require - 2.0577303 - FZÚ 2024 RIV US eng J - Journal Article
Písaříková, Aneta - Olejníček, Jiří - Venkrbcová, Ivana - Nožka, L. - Cichoň, Stanislav - Azinfar, A. - Hippler, Rainer - Helm, C.A. - Mašláň, M. - Machala, L. - Hubička, Zdeněk
CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 41, č. 6 (2023), č. článku 063005. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Research Infrastructure: CzechNanoLab II - 90251
Institutional support: RVO:68378271
Keywords : ECWR * magnetron sputtering * RF
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 2.9, year: 2022
Method of publishing: Open access
Permanent Link: https://hdl.handle.net/11104/0346510File Download Size Commentary Version Access 0577303.pdf 0 5.5 MB CC licence Publisher’s postprint open-access - 3.0531792 - FZÚ 2021 RIV CH eng J - Journal Article
Hubička, Zdeněk - Zlámal, M. - Olejníček, Jiří - Tvarog, Drahoslav - Čada, Martin - Krýsa, J.
Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system.
Coatings. Roč. 10, č. 3 (2020), s. 1-14, č. článku 232. E-ISSN 2079-6412
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA17-20008S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : photocathode film * r-HiPIMS plus ECWR plasma * r-HiPIMS plasma * copper iron oxide * photocurrent
OECD category: Materials engineering
Impact factor: 2.881, year: 2020
Method of publishing: Open access
Permanent Link: http://hdl.handle.net/11104/0310408File Download Size Commentary Version Access 0531792.pdf 0 3.6 MB CC licence Publisher’s postprint open-access - 4.0518947 - FZÚ 2020 RIV cze P1 - User Module
Čada, Martin - Hubička, Zdeněk
Zařízení pro vytváření vysokofrekvenčního plazmového výboje s elektronovou cyklotronovou vlnovou rezonancí.
[Device for generating high frequency plasma discharge with electron cyclotron wave resonance.]
2019. Owner: Fyzikální ústav AV ČR, v. v. i. Date of the utility model acceptance: 05.11.2019. Utility model number: 33342
R&D Projects: GA TA ČR TF03000025
Institutional support: RVO:68378271
Keywords : ECWR výboj * elektrické předpětí
OECD category: Fluids and plasma physics (including surface physics)
https://isdv.upv.cz/webapp/resdb.print_detail.det?pspis=PUV/35478&plang=CS
Permanent Link: http://hdl.handle.net/11104/0303947 - 5.0462264 - FZÚ 2017 RIV cze P1 - User Module
Hubička, Zdeněk - Čada, Martin - Kment, Štěpán - Olejníček, Jiří - Adámek, Petr - Straňák, Vítězslav
Vysokofrekvenční aparatura pro měření parametrů plazmatu s využitím vlnové rezonance elektronové cyklotronové vlny.
[Radio-frequency apparatus for measuring plasma parameters by making use of wave resonance of electron cyclotron wave.]
2016. Owner: Fyzikální ústav AV ČR, v. v. i. Date of the utility model acceptance: 07.06.2016. Utility model number: 29519
R&D Projects: GA TA ČR TA03010743
Institutional support: RVO:68378271
Keywords : ECWR * low-temprature plasma * thin film * plasma density * plasma deposition
OECD category: Fluids and plasma physics (including surface physics)
https://isdv.upv.cz/doc/FullFiles/UtilityModels/FullDocuments/FDUM0029/uv029519.pdf
Permanent Link: http://hdl.handle.net/11104/0261744 - 6.0393045 - FZÚ 2014 RIV CH eng J - Journal Article
Straňák, V. - Herrendorf, A.-P. - Wulff, H. - Drache, S. - Čada, Martin - Hubička, Zdeněk - Tichý, M. - Hippler, R.
Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering.
Surface and Coatings Technology. Roč. 222, MAY (2013), s. 112-117. ISSN 0257-8972
R&D Projects: GA ČR(CZ) GAP205/11/0386; GA MŠMT LD12002
Institutional support: RVO:68378271
Keywords : HiPIMS * ECWR * TiO2 * Rutile * Anatase * IDF
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 2.199, year: 2013
Permanent Link: http://hdl.handle.net/11104/0221796 - 7.0377251 - FZÚ 2013 RIV US eng J - Journal Article
Straňák, V. - Herrendorf, A.-P. - Drache, S. - Čada, Martin - Hubička, Zdeněk - Tichý, M. - Hippler, R.
Highly ionized physical vapor deposition plasma source working at very low pressure.
Applied Physics Letters. Roč. 100, č. 14 (2012), "141604-1"-"141604-3". ISSN 0003-6951. E-ISSN 1077-3118
R&D Projects: GA TA ČR TA01010517; GA ČR(CZ) GAP205/11/0386; GA ČR GAP108/12/1941
Institutional research plan: CEZ:AV0Z10100522
Keywords : magnetron * ECWR * low-pressure * sputtering * plasma diagnostics
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 3.794, year: 2012
http://dx.doi.org/10.1063/1.3699229
Permanent Link: http://hdl.handle.net/11104/0209459