0574018 - ÚJF 2024 RIV NL eng J - Journal Article
Romanenko, Oleksandr V. - Lavrentev, Vasyl - Borodkin, Andrei - Havránek, Vladimír - Macková, Anna
Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film.
Nuclear Instruments & Methods in Physics Research Section B. Roč. 538, MAY (2023), s. 123-130. ISSN 0168-583X. E-ISSN 1872-9584
R&D Projects: GA MŠMT EF18_053/0017163
Institutional support: RVO:61389005 ; RVO:67985882
Keywords : PMMA shrinkage * Ion beam lithography * Microstructuring * Diffraction grating
OECD category: Nuclear physics; Optics (including laser optics and quantum optics) (URE-Y)
Impact factor: 1.4, year: 2023 ; AIS: 0.315, rok: 2023
Method of publishing: Limited access
Result website:
https://doi.org/10.1016/j.nimb.2023.02.001DOI: https://doi.org/10.1016/j.nimb.2023.02.001
Permanent Link: https://hdl.handle.net/11104/0344381