0531897 - FZÚ 2021 RIV CH eng J - Journal Article
Müller, Martin - Bouša, Milan - Hájková, Zdeňka - Ledinský, Martin - Fejfar, Antonín - Drogowska-Horna, Karolina A. - Kalbáč, Martin - Frank, Otakar
Transferless Inverted graphene/silicon heterostructures prepared by plasma-enhanced chemical vapor deposition of amorphous silicon on CVD graphene.
Nanomaterials. Roč. 10, č. 3 (2020), s. 1-10, č. článku 589. ISSN 2079-4991. E-ISSN 2079-4991
R&D Projects: GA MŠMT EF16_026/0008382; GA ČR(CZ) GA17-18702S; GA MŠMT(CZ) EF16_013/0001821; GA MŠMT LM2018110
Grant - others:OP VVV - CARAT CZ.02.1.01/0.0/0.0/16_026/0008382
Institutional support: RVO:68378271 ; RVO:61388955
Keywords : silicon * graphene * heterostructure * CDV
OECD category: Condensed matter physics (including formerly solid state physics, supercond.); Physical chemistry (UFCH-W)
Impact factor: 5.076, year: 2020 ; AIS: 0.756, rok: 2020
Method of publishing: Open access
DOI: https://doi.org/10.3390/nano10030589
Permanent Link: http://hdl.handle.net/11104/0310529