High-quality dense ZnO thin films: work function and photo/electrochemical properties

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SYSNO	0582298
Title	High-quality dense ZnO thin films: work function and photo/electrochemical properties
Author(s)	Krýsová, Hana (UFCH-W)_{RID, ORCID} Mansfeldová, Věra (UFCH-W)_RID Tarábková, Hana (UFCH-W)_{RID, ORCID} Písaříková, Aneta (FZU-D)_ORCID Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI} Kavan, Ladislav (UFCH-W)_{RID, ORCID}
Corespondence/senior	Kavan, Ladislav - Korespondující autor
Source Title	Journal of Solid State Electrochemistry. (2024). - : Springer
Document Type	Článek v odborném periodiku
Grant	GA22-24138S GA ČR - Czech Science Foundation (CSF)
Institutional support	UFCH-W - RVO:61388955 ; FZU-D - RVO:68378271
Language	eng
Country	DE
Keywords	atomic layer deposition * mott-schottky analysis * doped zno * tio2 * rf * crystalline * growth * oxide * al * Zinc oxide * Mott-Schottky analysis * Kelvin probe * Photoelectrochemistry * Spray pyrolysis * Reactive magnetron sputtering
Cooperating institutions	FZU, Inst Phys Czech Acad Sci, Slovance 2, Prague 8, Czech Republic
URL	https://link.springer.com/article/10.1007/s10008-023-05766-6
Permanent Link	https://hdl.handle.net/11104/0350413

Number of the records: 1