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Ultrafast infrared laser crystallization of amorphous Si/Ge multilayer structures

  1. 1.
    SYSNO0571963
    TitleUltrafast infrared laser crystallization of amorphous Si/Ge multilayer structures
    Author(s) Bulgakov, Alexander (FZU-D) ORCID
    Beránek, Jiří (FZU-D)
    Volodin, V.A. (RU)
    Cheng, Y. (RU)
    Levy, Yoann (FZU-D)
    Nagisetty, S.S. (DE)
    Zukerstein, Martin (FZU-D) ORCID
    Popov, A. A. (RU)
    Bulgakova, Nadezhda M. (FZU-D) ORCID
    Corespondence/seniorBulgakova, Nadezhda M. - Korespondující autor
    Source Title Materials. Roč. 16, č. 9 (2023). - : MDPI
    Article number3572
    Document TypeČlánek v odborném periodiku
    Grant CZ.02.1.01/0.0/0.0/15_003/0000445, XE - EU countries
    EF15_003/0000445 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryCH
    Keywords silicon–germanium multilayer structures * thin films * ultrashort infrared laser annealing * selective crystallization * defect accumulation * Raman spectroscopy
    URLhttps://hdl.handle.net/11104/0342818
    Permanent Linkhttps://hdl.handle.net/11104/0342818
    FileDownloadSizeCommentaryVersionAccess
    0571963.pdf011.6 MBCC licencePublisher’s postprintopen-access
     
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