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In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu.sub.2./sub.O.sub.3./sub.

  1. 1.
    SYSNO0546180
    TitleIn-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3
    Author(s) Irimiciuc, Stefan (FZU-D) ORCID
    More Chevalier, Joris (FZU-D) ORCID
    Chertopalov, Sergii (FZU-D) ORCID
    Fekete, Ladislav (FZU-D) RID, ORCID
    Novotný, Michal (FZU-D) RID, ORCID, SAI
    Havlová, Šárka (FZU-D) ORCID
    Poupon, Morgane (FZU-D) ORCID
    Zikmund, Tomáš (FZU-D)
    Kůsová, Kateřina (FZU-D) RID, ORCID
    Lančok, Ján (FZU-D) RID, ORCID
    Corespondence/seniorIrimiciuc, Stefan - Korespondující autor
    Source Title Applied Physics B-Lasers and Optics. Roč. 127, č. 10 (2021). - : Springer
    Article number140
    Document TypeČlánek v odborném periodiku
    Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries
    EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    GA18-17834S GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryDE
    Keywords expansion * dynamics * ablation * target * oxides
    URLhttps://doi.org/10.1007/s00340-021-07689-4
    Permanent Linkhttp://hdl.handle.net/11104/0322752
     
Number of the records: 1  

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