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In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films
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SYSNO 0546089 Title In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films Author(s) Novotný, Michal (FZU-D) RID, ORCID, SAI
Fitl, Přemysl (FZU-D) RID, ORCID
Irimiciuc, S.A. (RO)
Bulíř, Jiří (FZU-D) RID, ORCID, SAI
More Chevalier, Joris (FZU-D) ORCID
Fekete, Ladislav (FZU-D) RID, ORCID
Hruška, Petr (FZU-D) ORCID
Chertopalov, Sergii (FZU-D) ORCID
Vrňata, M. (CZ)
Lančok, Ján (FZU-D) RID, ORCIDCorespondence/senior Novotný, Michal - Korespondující autor Source Title Journal of Applied Physics. Roč. 130, č. 8 (2021). - : AIP Publishing Article number 085301 Document Type Článek v odborném periodiku Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic GA20-21069S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic Institutional support FZU-D - RVO:68378271 Language eng Country US Keywords silver * thin films * insitu measurement URL https://doi.org/10.1063/5.0057317 Permanent Link http://hdl.handle.net/11104/0322679
Number of the records: 1