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Depth profile of acceptor concentration in InGaN/GaN multiple quantum wells

  1. 1.
    SYSNO0542725
    TitleDepth profile of acceptor concentration in InGaN/GaN multiple quantum wells
    Author(s) Hájek, František (FZU-D) ORCID
    Hospodková, Alice (FZU-D) RID, ORCID, SAI
    Hubáček, Tomáš (FZU-D) ORCID
    Oswald, Jiří (FZU-D) RID, ORCID
    Pangrác, Jiří (FZU-D) RID, ORCID, SAI
    Dominec, Filip (FZU-D) RID, ORCID
    Horešovský, Robert (FZU-D)
    Kuldová, Karla (FZU-D) RID, ORCID
    Corespondence/seniorHájek, František - Korespondující autor
    Source Title Journal of Luminescence. Roč. 236, Aug (2021). - : Elsevier
    Article number118127
    Document TypeČlánek v odborném periodiku
    Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries
    EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    FW03010298 GA TA ČR - Technology Agency of the Czech Republic (TA ČR), CZ - Czech Republic
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryNL
    Keywords nitrides * impurity * SIMS * InGaN/GaN
    URLhttp://hdl.handle.net/11104/0320090
    Permanent Linkhttp://hdl.handle.net/11104/0320090
    FileDownloadSizeCommentaryVersionAccess
    0542725.pdf41 MBAuthor’s postprintopen-access
     
Number of the records: 1  

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