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Depth profile of acceptor concentration in InGaN/GaN multiple quantum wells
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SYSNO 0542725 Title Depth profile of acceptor concentration in InGaN/GaN multiple quantum wells Author(s) Hájek, František (FZU-D) ORCID
Hospodková, Alice (FZU-D) RID, ORCID, SAI
Hubáček, Tomáš (FZU-D) ORCID
Oswald, Jiří (FZU-D) RID, ORCID
Pangrác, Jiří (FZU-D) RID, ORCID, SAI
Dominec, Filip (FZU-D) RID, ORCID
Horešovský, Robert (FZU-D)
Kuldová, Karla (FZU-D) RID, ORCIDCorespondence/senior Hájek, František - Korespondující autor Source Title Journal of Luminescence. Roč. 236, Aug (2021). - : Elsevier Article number 118127 Document Type Článek v odborném periodiku Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic FW03010298 GA TA ČR - Technology Agency of the Czech Republic (TA ČR), CZ - Czech Republic Institutional support FZU-D - RVO:68378271 Language eng Country NL Keywords nitrides * impurity * SIMS * InGaN/GaN URL http://hdl.handle.net/11104/0320090 Permanent Link http://hdl.handle.net/11104/0320090 File Download Size Commentary Version Access 0542725.pdf 4 1 MB Author’s postprint open-access
Number of the records: 1