Number of the records: 1  

Deposition of cobalt oxide films by reactive pulsed magnetron sputtering

  1. 1.
    SYSNO0541687
    TitleDeposition of cobalt oxide films by reactive pulsed magnetron sputtering
    Author(s) Hippler, Rainer (FZU-D) ORCID
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Kšírová, Petra (FZU-D) RID, ORCID
    Olejníček, Jiří (FZU-D) RID, ORCID
    Jiříček, Petr (FZU-D) RID, ORCID, SAI
    Houdková, Jana (FZU-D) RID, ORCID
    Wulff, H. (DE)
    Kruth, A. (DE)
    Helm, C.A. (DE)
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Corespondence/seniorHippler, Rainer - Korespondující autor
    Source Title Surface and Coatings Technology. Roč. 405, Jan (2021). - : Elsevier
    Article number126590
    Document TypeČlánek v odborném periodiku
    Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries
    EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    FV20580 GA MPO - Ministry of Industry and Trade (MPO)
    GA19-00579S GA ČR - Czech Science Foundation (CSF)
    StrategieAV21/6, CZ - Czech Republic
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryCH
    Keywords cobalt oxide film * pulsed magnetron sputtering * HiPIMS * Raman spectroscopy * XPS * XRD * electrical resistivity
    URLhttps://doi.org/10.1016/j.surfcoat.2020.126590
    Permanent Linkhttp://hdl.handle.net/11104/0319218
     
Number of the records: 1  

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