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The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor
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SYSNO 0541267 Title The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor Author(s) Wandell, R. J. (US)
Bresch, D. (FR)
Wang, H. (US)
Babický, Václav (UFP-V) [IPS] RID
Lukeš, Petr (UFP-V) [IPS] RID, ORCID
Locke, B. R. (US)Source Title International Journal of Plasma Environmental Science and Technology. Roč. 14, č. 1 (2020), s. 1-9. - : Seidenki Gakkai Article number e01008 Document Type Článek v odborném periodiku Grant GA19-25026S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic EF16_027/0008354 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic Institutional support UFP-V - RVO:61389021 Language eng Country JP Keywords Filamentary discharge * Hydrogen peroxide * Nanosecond discharge * Non-thermal plasma * Pulse frequency * Wet plasma Cooperating institutions Florida State University (United States) URL http://ijpest.com/Contents/14/1/e01008.html Permanent Link http://hdl.handle.net/11104/0318855
Number of the records: 1