Number of the records: 1  

Advances in chemical lift-off lithography

    1.
    SYSNO0535135
    TitleAdvances in chemical lift-off lithography
    Author(s) Cheung, K. (US)
    Goronzy, D. P. (US)
    Stemer, D. (US)
    Zhao, CH. (US)
    Young, T. (US)
    Belling, J. (US)
    Baše, Tomáš (UACH-T) RID, SAI, ORCID
    Andrews, A. (US)
    Weiss, P. (US)
    Source Title Abstracts of papers - American Chemical Society. Roč. 258, AUG (2019)
    Conference ACS Fall National Meeting and Exposition, 25.08.2019 - 29.08.2019, San Diego
    Article number277-ANYL
    Document TypeAbstrakt
    Institutional supportUACH-T - RVO:61388980
    Languageeng
    CountryUS
    Keywords lift-off lithography
    Permanent Linkhttp://hdl.handle.net/11104/0313227
     
Number of the records: 1  

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