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Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system
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SYSNO 0531792 Title Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system Author(s) Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Zlámal, M. (CZ)
Olejníček, Jiří (FZU-D) RID, ORCID
Tvarog, Drahoslav (FZU-D) ORCID
Čada, Martin (FZU-D) RID, ORCID, SAI
Krýsa, J. (CZ)Corespondence/senior Hubička, Zdeněk - Korespondující autor Source Title Coatings. Roč. 10, č. 3 (2020), s. 1-14. - : MDPI Article number 232 Document Type Článek v odborném periodiku Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic FV20580 GA MPO - Ministry of Industry and Trade (MPO) GA17-20008S GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 Language eng Country CH Keywords photocathode film * r-HiPIMS plus ECWR plasma * r-HiPIMS plasma * copper iron oxide * photocurrent URL http://hdl.handle.net/11104/0310408 Permanent Link http://hdl.handle.net/11104/0310408 File Download Size Commentary Version Access 0531792.pdf 0 3.6 MB CC licence Publisher’s postprint open-access
Number of the records: 1