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Characterization of graphene oxide film by implantation of low energy copper ions

  1. 1.
    SYSNO0520862
    TitleCharacterization of graphene oxide film by implantation of low energy copper ions
    Author(s) Cutroneo, Mariapompea (UJF-V) [ONF] ORCID, RID, SAI
    Torrisi, L. (IT)
    Havránek, Vladimír (UJF-V) [ONF] RID, SAI, ORCID
    Macková, Anna (UJF-V) [ONF] RID, ORCID, SAI
    Malinský, Petr (UJF-V) [ONF] RID, ORCID, SAI
    Torrisi, Alfio (UJF-V) [ONF] RID, ORCID
    Stammers, James H. (UJF-V) [ONF]
    Sofer, Z. (CZ)
    Silipigni, L. (IT)
    Fazio, B. (IT)
    Fazio, M. (IT)
    Bottger, R. (DE)
    Source Title Nuclear Instruments & Methods in Physics Research Section B. Roč. 460, č. 12 (2019), s. 169-174. - : Elsevier
    Conference 28th International Conference on Atomic Collisions in Solids (ICACS) / 10th International Symposium on Swift Heavy Ions in Matter (SHIM), 01.07.2018 - 07.07.2018, Caen
    Document TypeČlánek v odborném periodiku
    Grant LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GA16-05167S GA ČR - Czech Science Foundation (CSF)
    EF16_013/0001812 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportUJF-V - RVO:61389005
    Languageeng
    CountryNL
    Keywords low energy copper ions * ion implantation * composition graphene oxide
    Cooperating institutions Univerzita Jana Evangelisty Purkyně v Ústí nad Labem (Czech Republic)
    Vysoká škola chemicko-technologická v Praze (Czech Republic)
    URLhttps://doi.org/10.1016/j.nimb.2019.03.021
    Permanent Linkhttp://hdl.handle.net/11104/0305518
     
Number of the records: 1  

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