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Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
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SYSNO 0512095 Title Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering Author(s) Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Zlámal, M. (CZ)
Čada, Martin (FZU-D) RID, ORCID, SAI
Kment, Štěpán (FZU-D) RID, ORCID
Krysa, J. (CZ)Corespondence/senior Hubička, Zdeněk - Korespondující autor Source Title Catalysis Today. Roč. 328, May (2019), s. 29-34. - : Elsevier Document Type Článek v odborném periodiku Grant GA17-20008S GA ČR - Czech Science Foundation (CSF) CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic Institutional support FZU-D - RVO:68378271 Language eng Country NL Keywords high power impulse magnetron sputtering * reactive sputtering * magnetron discharge * photocathode * photocurrent * copper oxide URL https://doi.org/10.1016/j.cattod.2018.11.034 Permanent Link http://hdl.handle.net/11104/0302301
Number of the records: 1