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Ion-beam lithography: A promising technique for the patterning of graphene oxide foil
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SYSNO 0495721 Title Ion-beam lithography: A promising technique for the patterning of graphene oxide foil Author(s) Cutroneo, Mariapompea (UJF-V) [ONF] ORCID, RID, SAI
Havránek, Vladimír (UJF-V) [ONF] RID, SAI, ORCID
Macková, Anna (UJF-V) [ONF] RID, ORCID, SAI
Malinský, Petr (UJF-V) [ONF] RID, ORCID, SAI
Torrisi, L. (IT)
Perez-Hernandez, J. A. (ES)
Roso, L. (ES)
Luxa, J. (CZ)
Sofer, Z. (CZ)
Bottger, R. (DE)Source Title AIP Conference Proceedings, 17th International Conference on Ion Sources, 2011. - Melville : AIP Publishing, 2018 Conference 17th International Conference on Ion Sources, 15.09.2017 - 20.09.2017, Geneva Article number 090007 Document Type Konferenční příspěvek (zahraniční konf.) Grant LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA16-05167S GA ČR - Czech Science Foundation (CSF) EF16_013/0001812 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UJF-V - RVO:61389005 Language eng Country US Keywords graphene oxide foil * ion beam lithography * deoxygenation Cooperating institutions Univerzita Jana Evangelisty Purkyně v Ústí nad Labem (Czech Republic)
Vysoká škola chemicko-technologická v Praze (Czech Republic)Permanent Link http://hdl.handle.net/11104/0288651
Number of the records: 1