Hiding e-beam exposure fields by deterministic 2D pattering

Number of the records: 1

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SYSNO	0494364
Title	Hiding e-beam exposure fields by deterministic 2D pattering
Author(s)	Horáček, Miroslav (UPT-D)_{RID, ORCID, SAI} Knápek, Alexandr (UPT-D)_{RID, ORCID, SAI} Matějka, Milan (UPT-D)_{RID, ORCID, SAI} Krátký, Stanislav (UPT-D)_{RID, ORCID, SAI} Urbánek, M. (CZ) Mika, Filip (UPT-D)_{RID, SAI, ORCID} Kolařík, Vladimír (UPT-D)_{RID, ORCID, SAI}
Corespondence/senior	Kolařík, Vladimír - Korespondující autor
Source Title	Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar. S. 36-37. - Brno : Institute of Scientific Instruments The Czech Academy of Sciences, 2018
Conference	Recent Trends in Charged Particle Optics and Surface Physics Instrumentation, 04.06.2018 - 08.06.2018, Skalský dvůr
Document Type	Konferenční příspěvek (zahraniční konf.)
Grant	TE01020233 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
	TG03010046 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
	LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
	ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Institutional support	UPT-D - RVO:68081731
Language	eng
Country	CZ
Keywords	phyllotaxis * electron beam lithography
Permanent Link	http://hdl.handle.net/11104/0287595

Number of the records: 1