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FeS.sub.2./sub. thin films deposition by reactive high power magnetron sputtering in Ar+H.sub.2./sub.S gas mixture

SYSNO	0464298
Title	FeS₂ thin films deposition by reactive high power magnetron sputtering in Ar+H₂S gas mixture
Author(s)	Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Kment, Štěpán (FZU-D)_{RID, ORCID} Olejníček, Jiří (FZU-D)_{RID, ORCID}
Source Title	International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. S. 137-137. - Braunschweig : European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016
Conference	International Conference on Plasma Surface Engineering ( PSE 2016 ), 12.09.2016 - 16.09.2016, Garmisch-Partenkirchen
Document Type	Abstrakt
Grant	TA03010743 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	DE
Keywords	sputtering * HIPIMS * films * semiconductor * deposition
Permanent Link	http://hdl.handle.net/11104/0268994

Number of the records: 1