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High-rate reactive deposition of transparent SiO.sub.2./sub. films containing low amount of Zr from molten magnetron target

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    SYSNO0437497
    TitleHigh-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target
    Author(s) Musil, Jindřich (FZU-D) RID, ORCID
    Satava, V. (CZ)
    Baroch, P. (CZ)
    Source Title Thin Solid Films. Roč. 519, č. 2 (2010), s. 775-777. - : Elsevier
    Document TypeČlánek v odborném periodiku
    CEZAV0Z10100520 - FZU-D (2005-2011)
    Languageeng
    CountryCH
    Keywords sputtering * evaporation * reactive deposition * target power density
    Permanent Linkhttp://hdl.handle.net/11104/0241059
     
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