Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching

Number of the records: 1

1.

SYSNO	0432632
Title	Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching
Author(s)	Domonkos, Mária (FZU-D)_RID Ižák, Tibor (FZU-D)_RID Babchenko, Oleg (FZU-D)_{RID, ORCID} Varga, Marián (FZU-D)_{RID, ORCID} Hruška, Karel (FZU-D)_{RID, ORCID} Kromka, Alexander (FZU-D)_{RID, ORCID, SAI}
Source Title	Advanced Science, Engineering and Medicine. Roč. 6, č. 7 (2014), s. 780-784
Document Type	Článek v odborném periodiku
Grant	GAP108/12/0910 GA ČR - Czech Science Foundation (CSF)
	GAP108/12/0996 GA ČR - Czech Science Foundation (CSF)
	FR-TI2/736 GA MPO - Ministry of Industry and Trade (MPO)
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	US
Keywords	micro- and nanocrystalline diamond * capacitively coupled plasma * reactive ion etching * nanostructuring * scanning electron microscopy
Permanent Link	http://hdl.handle.net/11104/0237011

Number of the records: 1