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Effect of nitrogen doping on TiO.sub.x./sub.N.sub.y./sub. thin film formation at reactive high-power pulsed magnetron sputtering
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SYSNO 0358730 Title Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering Author(s) Straňák, Vítězslav (FZU-D) RID, ORCID
Quaas, M. (DE)
Bogdanowicz, R. (PL)
Steffen, H. (DE)
Wulff, H. (DE)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Tichý, M. (CZ)
Hippler, R. (DE)Source Title Journal of Physics D-Applied Physics. Roč. 43, č. 28 (2010), s. 1-7. - : Institute of Physics Publishing Document Type Článek v odborném periodiku Grant KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) 1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic M100100915, CZ - Czech Republic CEZ AV0Z10100522 - FZU-D (2005-2011) Language eng Country GB Keywords magnetron sputtering * TiO2 * pulse discharge * XRD * band gap URL http://iopscience.iop.org/0022-3727/43/28/285203/ Permanent Link http://hdl.handle.net/11104/0196679
Number of the records: 1