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Comparison between chemical and plasmatic treatment of seeding layer for patterned diamond growth
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SYSNO 0355161 Title Comparison between chemical and plasmatic treatment of seeding layer for patterned diamond growth Author(s) Kromka, Alexander (FZU-D) RID, ORCID, SAI
Babchenko, Oleg (FZU-D) RID, ORCID
Rezek, Bohuslav (FZU-D) RID, ORCID
Hruška, Karel (FZU-D) RID, ORCID
Purkrt, A. (CZ)
Remeš, Zdeněk (FZU-D) RID, ORCIDSource Title Diamond Electronics and Bioelectronics - Fundamentals to Applications III. S. 137-143. - Warrendale, PA : Materials Research Society, 2010 / Bergonzo P. ; Butler J.E. ; Jackman R.B. ; Loh K.P. ; Nesladek M. Conference MRS Fall Meeting 2009, Boston, 30.11.2009-04.12.2009 Document Type Konferenční příspěvek (zahraniční konf.) Grant LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) IAAX00100902 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR), CZ - Czech Republic KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KAN400480701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR), CZ - Czech Republic CEZ AV0Z10100521 - FZU-D (2005-2011) Language eng Country US Keywords diamond * plasma-enhanced CVD (PECVD) (deposition) * microstructure URL http://dx.doi.org/10.1557/PROC-1203-J17-53 Permanent Link http://hdl.handle.net/11104/0193993
Number of the records: 1