The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition

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SYSNO	0352722
Title	The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition
Author(s)	Červenka, Jiří (FZU-D)_{RID, ORCID} Ledinský, Martin (FZU-D)_{RID, ORCID, SAI} Stuchlík, Jiří (FZU-D)_{RID, ORCID} Stuchlíková, The-Ha (FZU-D)_{RID, ORCID} Bakardjieva, Snejana (UACH-T) [CIT]_{SAI, RID, ORCID} Hruška, Karel (FZU-D)_{RID, ORCID} Fejfar, Antonín (FZU-D)_{RID, ORCID, SAI} Kočka, Jan (FZU-D)_{RID, ORCID, SAI}
Source Title	Nanotechnology. Roč. 21, č. 41 (2010), 415604/1-415604/7. - : Institute of Physics Publishing
Document Type	Článek v odborném periodiku
Grant	LC06040 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
	KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	240826, XE - EU countries
CEZ	AV0Z10100521 - FZU-D (2005-2011)
	AV0Z40320502 - UACH-T (2005-2011)
Language	eng
Country	GB
Keywords	nanoneedles * nanowires * silicon * plasma * chemical vapor deposition * crystal structure * growth * phonon * SEM * Raman
Permanent Link	http://hdl.handle.net/11104/0192169

Number of the records: 1