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Determination of proximity effect forward scattering range parameter in e-beam lithography
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SYSNO 0350671 Title Determination of proximity effect forward scattering range parameter in e-beam lithography Author(s) Urbánek, Michal (UPT-D) RID
Kolařík, Vladimír (UPT-D) RID, ORCID, SAI
Král, Stanislav (UPT-D) RID, SAI
Dvořáková, Marie (UPT-D)Source Title Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. S. 67-68. - Brno : Institute of Scientific Instruments AS CR, v.v.i, 2010 / Mika F. Conference International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /12./, Skalský dvůr, 31.05.2010-04.06.2010 Document Type Konferenční příspěvek (zahraniční konf.) Grant FR-TI1/576 GA MPO - Ministry of Industry and Trade (MPO) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z20650511 - UPT-D (2005-2011) Language eng Country CZ Keywords electron beam lithography * proximity effect Permanent Link http://hdl.handle.net/11104/0190611
Number of the records: 1