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Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films

  1. 1.
    SYSNO0346487
    TitleDouble hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films
    Author(s) Kment, Štěpán (FZU-D) RID, ORCID
    Klusoň, Petr (UCHP-M) RID, ORCID, SAI
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Krýsa, J. (CZ)
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Gregora, Ivan (FZU-D) RID, ORCID
    Deyneka, Alexander (FZU-D)
    Remeš, Zdeněk (FZU-D) RID, ORCID
    Žabová, Hana (UCHP-M)
    Jastrabík, Lubomír (FZU-D) RID, ORCID
    Source Title Electrochimica acta. Roč. 55, č. 5 (2010), s. 1548-1556. - : Elsevier
    Document TypeČlánek v odborném periodiku
    Grant KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GA202/09/0800 GA ČR - Czech Science Foundation (CSF)
    KJB100100703 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z10100522 - FZU-D (2005-2011)
    AV0Z40720504 - UCHP-M (2005-2011)
    Languageeng
    CountryGB
    Keywords TiO * plasma jets
    Permanent Linkhttp://hdl.handle.net/11104/0187508
     
Number of the records: 1  

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