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Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide

  1. 1.
    SYSNO0343204
    TitleOptical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide
    Author(s) Novotný, Michal (FZU-D) RID, ORCID, SAI
    Bulíř, Jiří (FZU-D) RID, ORCID, SAI
    Pokorný, Petr (FZU-D) RID, ORCID, SAI
    Bočan, Jiří (FZU-D) RID
    Fitl, Přemysl (FZU-D) RID, ORCID
    Lančok, Ján (FZU-D) RID, ORCID
    Musil, Jindřich (FZU-D) RID, ORCID
    Source Title Journal of Optoelectronics and Advanced Materials. Roč. 12, č. 3 (2010), 697-700. - : NATL INST OPTOELECTRONICS
    Document TypeČlánek v odborném periodiku
    Grant IAA100100718 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KAN400100653 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GP202/09/P324 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z10100522 - FZU-D (2005-2011)
    Languageeng
    CountryRO
    Keywords reactive magnetron sputtering * alumina * plasma spectroscopy * mass spectroscopy * optical emission spectroscopy
    Permanent Linkhttp://hdl.handle.net/11104/0005901
     
Number of the records: 1  

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