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Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes

    1.
    SYSNO0341918
    TitleConjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes
    Author(s) Schauer, F. (CZ)
    Schauer, Petr (UPT-D) RID, SAI, ORCID
    Kuřitka, I. (CZ)
    Hua, B. (CN)
    Source Title Materials Transactions. Roč. 51, č. 2 (2010), s. 197-201. - : Japan Institute of Metals and Materials
    Document TypeČlánek v odborném periodiku
    Grant IAA100100622 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z20650511 - UPT-D (2005-2011)
    Languageeng
    CountryJP
    Keywords ultra violet degradability * polysilylenes * weak bond * conformation defect * nanorezists
    Permanent Linkhttp://hdl.handle.net/11104/0184761
     
Number of the records: 1  

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